“…However, in the last two decades, advances in group-IV epitaxy have made possible to grow SiGe multilayer systems with high crystal quality [4][5][6][7][8] ; consequently this class of materials is attracting increasing research efforts, mainly motivated by its prompt integrability with the mainstream CMOS standard. In particular, in the last ten years, SiGe Ge-rich structures have been actively investigated, and applications have been proposed in different contexts as for instance quantum computing [8][9][10] , Si-based photonics [11][12][13] , high mobility transistors 14,15 , and thermoelectricity 16,17 . The recently demonstrated 18 incorporation of Sn to obtain Ge-rich ternary SiGeSn alloys has further enlarged the design flexibility of this material system.…”