Design considerations for industrial rear passivated solar cells

Abstract

In this work, the solar cell development issues arising by adding a dielectric rear side passivation to a standard screen-printing process are discussed with deposited Al type Cz-Si as an example. The influence of several design parameters is assessed in simulation and experiment and an optimization strategy is presented. These parameters include optical properties of the cell, like the choice of dielectric layer thickness and wafer surface roughness, parameters that influence the passivation quality like the temperature of the co in a belt furnace as well as electrical parameters like contact geometry, contact spacing and base resistivity. Their influence on the three efficiency-determining quantities, V OC outlined. Special attention is paid to minimizing the inevitable loss in FF in a PERC design.Index Terms -dielectric films, finite element methods, photovoltaic cells, semiconductor device manufacture,

Low-cost foil metallization using arc discharge for passivated emitter and rear solar cells

“…For the cost reduction of the rear contact forming process, some approaches were reported. The fire-through contact approach was examined for rear surface passivation layers such as silicon oxide 5) and aluminum oxide layers, 6) and the possibility for the fire-through contact approach to be adopted to contact formation was suggested. Etching paste was used for the contact opening process.…”