accordingly such coatings are typically more stressed and have a lower degree of crystallinity than CVD Laser chemical vapour deposition (LCVD) is a new coatings.manufacturing process that holds great potential Sputtering, evaporation, and laser CVD are essenfor the production of small and complex metal and ceramic parts. Recent research significant to LCVD tially line of sight processes. The other CVD processes is reviewed, summarising the general state of are capable of more thoroughly coating all surfaces knowledge in the field, and discussing important of the substrate. If process variables are selected to challenges that remain. The basics of the LCVD enhance infiltration, as opposed to overcoating of the process and the various deposition techniques, substrate, a variant of conventional CVD termed including: photolytic versus pyrolytic deposition chemical vapour infiltration can be used to deposit and fibre growth versus direct writing methods, within a fibrous preform the matrix of a fibre are considered. A comprehensive table of reinforced composite.10 materials deposited with LCVD is presented,In some instances it becomes difficult to classify a sorted geometrically into fibres, dots, and lines.
particular process. Consider reactive sputtering ofThe application of heat transfer and chemical kinetic models to the LCVD process as a means for titanium nitride. A titanium target is used in a sputterpredicting deposit properties is described. The ing apparatus but nitrogen, a chemical reagent, is deposition process is considered with respect to added to the atmosphere to promote the chemical efforts to increase deposition rates and to control reaction resulting in the formation of a titanium deposit shapes. Modern process control nitride coating. Is this sputtering, CVD, or a combitechniques for measuring deposition temperature nation of the two processes? Further, if an ion beam and growth rate are also discussed. Finally, a were used to promote coating adherence, the process survey of mechanical, electrical, and optical just described would possess characteristics resemapplications is presented.IMR/366bling an ion plating process. Yee1 provides further description and classification of the processes men-
