2020
DOI: 10.1002/asjc.2275
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Design of a run‐to‐run controller based on discrete sliding‐mode observer

Abstract: In this study, a run‐to‐run controller based on a discrete sliding‐mode observer (DSMO) is presented for photolithography manufacturing processes. A second‐order DSMO is introduced to estimate the process disturbances caused by tool aging and preventive maintenance. The proposed controller is constructed by applying DSMO estimation to the deadbeat control law and the stable region is discussed. Numerical simulations and an industrial case demonstrated the performance of the proposed algorithm. It is observed t… Show more

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Cited by 4 publications
(2 citation statements)
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“…The system was shown to outperform EWMA and double EWMA controllers in the rejection of IMA disturbances with a shift or drift (as occurs in tool aging). It also performed better under plant-model mismatch and had better tolerance for metrology delay [102].…”
Section: Semiconductor Manufacturingmentioning
confidence: 99%
“…The system was shown to outperform EWMA and double EWMA controllers in the rejection of IMA disturbances with a shift or drift (as occurs in tool aging). It also performed better under plant-model mismatch and had better tolerance for metrology delay [102].…”
Section: Semiconductor Manufacturingmentioning
confidence: 99%
“…Over the past decades, run-to-run (RtR) control has become a crucial technology for improving the quality of semiconductor manufacturing processes (Liu et al, 2018). Although research on RtR control has been extensively investigated, the issue of anti-disturbance remains a major focus (Tan et al, 2020; Wang et al, 2021). As the workhorse of RtR control, exponential weighted moving average (EWMA) schemes have shown promising results in semiconductor manufacturing processes due to its simplicity and intuitiveness (Wang et al, 2010; Zhong et al, 2021).…”
Section: Introductionmentioning
confidence: 99%