Design of nano-lithographic system based on phase photon sieve

Abstract

A nano-lithographic system based on phase photon sieve is proposed in this paper to overcome the disadvantages of zone plate array lithographic system and amplitude photon sieve lithographic system. As an important part of the system performance, the resolution of this system is mainly decided by the diffractive element. The phase photon sieve was used as the diffractive element in the proposed system. The structure and performance of the phase photon sieve is therefore very important to the resolution of this system. So, two methods are proposed for the designs and fabrication of the lithographic system based on phase photon sieve. The feasibility of using this system to realize nano-lithography with a resolution is of less than 100nm was then discussed. It is shown through analysis that the system not only has higher resolution and image contrast than the zone plate array lithographic system but also has higher diffractive efficiency than the amplitude photon sieve lithographic system. As a novel lithographic technique, the phase photon sieve lithographic system also offers new opportunities for high resolution X-ray microscopy and spectroscopy in physical and life sciences.Keywords: zone plate array lithography (ZPAL), amplitude photon sieve lithography (APSL), phase photon sieve lithography (PPSL), diffractive element, design and fabrication method, nano-lithographic

Research on Specification Uncertainty in the Next Generation GPS

“…This GPS language makes specification of the product more detailed, and thus to reduce the specification uncertainty of the product. Then, the resources among different departments of the company can be optimized [2]. This is one of the great motivations of the next generation GPS [3].…”