Abstract:<p>This letter proposes a memory cell, denoted by 1F-1T, consisting of a ferroelectric field-effect transistor (Fe-FET) cascoded with another current-limiting transistor (T). The transistor reduces the impact of drain current (Id) variations by limiting the on-state current in FeFET, denoted by 1F. We have fabricated 28nm high-k-meta-gate (HKMG) based FeFETs, and the experimental data is used to model and simulate single-cell and memory arrays. The simulation shows significant improvement in bit-line (BL… Show more
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