Parameter variations and soft errors are the major design challenges in nanometer process technology, causing errors in the internal nodes. The basic concept for solving these problems at the circuit level, called design for variability (DFV), is to add error handling functions to the conventional circuits to increase robustness toward nanometer process-related errors. A DFV-aware finite state machine (FSM) is one of the major design challenges in nanometer circuits. Robust FSMs in a high-performance integrated circuit should not have a large area overhead, since it requires many FSMs and is usually very complex to implement. Most existing fault-tolerant FSMs can detect or correct only one bit error. We propose an area-efficient error detection and error correction architecture which can detect and correct multiple bit errors for nanometer FSMs.