2022
DOI: 10.1016/j.progpolymsci.2022.101625
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Designing high χ copolymer materials for nanotechnology applications: A systematic bulk vs. thin films approach

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Cited by 16 publications
(19 citation statements)
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“…Typically, the use of BCPs with high-c and low N is a common strategy to achieve this goal. [13][14][15] Much work has been done on material design of high-c block copolymers. Some indicative high-c systems that have yielded ultra-small feature sizes are poly(styrene)-block-poly(glycerol monomethacrylate) (PS-b-PGM), 16,17 poly(cyclohexylethylene)-blockpoly(methyl methacrylate) (PCHE-b-PMMA), 18 poly(dimethylsiloxane)-block-poly(D,L-lactide) (PDMS-b-PLA) 19,20 and poly(4-trimethylsilylstyrene)-block-poly(D,L-lactide) (PTMSS-b-PLA).…”
Section: Introductionmentioning
confidence: 99%
“…Typically, the use of BCPs with high-c and low N is a common strategy to achieve this goal. [13][14][15] Much work has been done on material design of high-c block copolymers. Some indicative high-c systems that have yielded ultra-small feature sizes are poly(styrene)-block-poly(glycerol monomethacrylate) (PS-b-PGM), 16,17 poly(cyclohexylethylene)-blockpoly(methyl methacrylate) (PCHE-b-PMMA), 18 poly(dimethylsiloxane)-block-poly(D,L-lactide) (PDMS-b-PLA) 19,20 and poly(4-trimethylsilylstyrene)-block-poly(D,L-lactide) (PTMSS-b-PLA).…”
Section: Introductionmentioning
confidence: 99%
“…The ability of polymers to self-assemble in bulk or thin films using solvents with different selectivity enables the formation of various well-defined morphologies at the nanoscale. This fundamental characteristic is of major importance, leading to their possible utilization in nano-lithographic applications as reported in the literature [ 1 , 2 , 3 ].…”
Section: Introductionmentioning
confidence: 99%
“…To overcome this limitation, several strategies have been employed, such as the use of homopolymer brushes (hydroxyl-terminated PS and/or PDMS), pre-patterned surfaces, solvent annealing, etc. [ 1 , 37 , 38 , 39 , 40 , 41 ].…”
Section: Introductionmentioning
confidence: 99%
“…For more than three decades, microphase separation in linear diblock copolymers has been thoroughly studied. Nowadays, the main scientific discussion involves the self-assembly of diblock copolymers as well as their strong dependence on χ N and φ values (where χ indicates the immiscibility between blocks, N corresponds to the total degree of polymerization, and φ is the volume fraction). Due to their unique properties and their ability to spontaneously self-assemble, without employing any external stimuli, diblock copolymers have been used in a vast number of nanotechnology applications, such as thin films, nanolithography masks, flexible nanostructures, , wearable technologies, etc. , …”
Section: Introductionmentioning
confidence: 99%
“…Numerous scientific groups have made extensive efforts to efficiently elaborate the origins of microphase separation on diblock copolymers and have utilized different strategies to obtain various morphologies. , To date, four major equilibrium morphologies have been obtained from diblock copolymers such as spheres, cylinders, double gyroid, and lamellae. ,,, …”
Section: Introductionmentioning
confidence: 99%