Synchrotron-based high-resolution photoemission has been used to study the interaction of thiophene, pyridine, and cyclohexylamine (CHA) with pure and Ni-promoted MoS x films and S/Mo(110) surfaces. The MoS x films exhibit Mo 3d and valence spectra that are very similar to those of MoS 2 . On the MoS x systems, the behavior of thiophene closely resembles that seen on MoS 2 (0002). The molecules are weakly chemisorbed, and most of them desorb at temperatures around 200 K. A small fraction of the adsorbed thiophene is bonded to Mo sites that have S vacancies and desorbs between 250 and 300 K. A similar behavior is observed for adsorbed pyridine. In contrast, CHA displays a rich chemistry on these surfaces. Mo centers that have a limited number of S vacancies and do not do chemistry with thiophene, pyridine, or H 2 are able to cleave the C-N bond in a nonaromatic H-rich molecule like CHA. The addition of Ni enhances the chemical activity of MoS x . On the NiMoS x systems, the adsorption energies of thiophene and pyridine are 5-10 kcal/mol larger than those on pure MoS x . But no dissociation of these molecules is observed on the NiMoS x surfaces. The Ni T S interactions reduce the reactivity of nickel, and the presence of this metal alone is not enough to promote or facilitate the cleavage of aromatic C-S or C-N bonds. Hydrogen seems to play an important role in this aspect. Extensive decomposition of thiophene is observed after creating S vacancies in MoS x and Ni/S/Mo(110) surfaces by reaction with atomic hydrogen (2H gas + S surface f H 2 S gas + vacancy surface ). The role of Ni in NiMoS x catalysts for hydrodesulfurization and hydrodenitrogenation processes is discussed in light of these results.