Detached Glow Above a Titanium Hollow Cathode Sputter Source

Niedrist, R.; Schrittwieser, R.

doi:10.1109/tps.2011.2162855

Cited by 2 publications

(1 citation statement)

References 6 publications

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“…At the end of the current pulse (point B in figure 4), the light emission of the HC plasma is more intense in the presence of the external magnetic field (figure 6(d)). The light emission of the afterglow plasma (point C in figure 4) shows a spatial expansion of the plasma volume, which tends to detach from the cathode exit, moving towards the anode, as was also observed in former DCHC experiments [19].…”

Section: Fast Intensified Charge-coupled Device (Iccd) Imagingsupporting

confidence: 72%

Enhanced extraction efficiency of the sputtered material from a magnetically assisted high power impulse hollow cathode

Tiron

Velicu

Nastuta

et al. 2018

Plasma Sources Sci. Technol.

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The high power impulse hollow cathode sputtering (HiPIHCS) technique was pioneered by researchers attempting to combine the high ionization degree of sputtered species in a high power impulse magnetron sputtering discharge with the highly energetic electrons from a hollow cathode (HC) in order to obtain high-density and high-energy fluxes of sputtered metal species. Hence, this novel technique may open new horizons in surface engineering, offering the ability to control, enhance and tailor coating properties by using additional electric and/or magnetic fields. However, there are still many issues to be solved, including the ionization degree of the sputtered material and the deposition rate, as well as the extraction efficiency. This work reports on the improvement of the extraction efficiency of the sputtered material in an HiPIHCS process when an external magnetic field is applied. The HiPIHCS discharge was operated with ultrashort pulses (5 μs) of high voltage (600-800 V) applied directly on the HC. The obtained experimental results show that the extraction efficiency of both neutral and ionized sputtered material increases at least by a factor of two when an external magnetic field of only 15 mT is applied in the HC discharge region.

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Section: Fast Intensified Charge-coupled Device (Iccd) Imagingsupporting

confidence: 72%

Enhanced extraction efficiency of the sputtered material from a magnetically assisted high power impulse hollow cathode

Tiron

Velicu

Nastuta

et al. 2018

Plasma Sources Sci. Technol.

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Characteristics of plasma in culture medium generated by positive pulse voltage and effects of organic compounds on its characteristics

Sato

Yoshino

2016

Plasma Sources Sci. Technol.

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We describe a positive pulse voltage method for generating plasma in culture medium with a composition similar to biological fluids. We also describe the plasma's characteristics, liquid quality, and the effect of organic compounds in the culture medium on the plasma characteristics through comparisons to a solution containing inorganic salts at the same concentrations as in the culture medium. Light emission with Na and OH spectra was observed within a vapor bubble produced by Joule heating at the tip of the electrode. A downward thermal flow and shock wave were caused by the behavior of the vapor bubble. The culture medium pH gradually increased from 7.9 to 8.3 over the discharge time of 300 s. H 2 O 2 was generated 1.1 mg l −1 in the culture medium after discharge for 300 s, and this value was 0.5 mg l −1 lower than the inorganic salts solution which does not contain organic compounds. This study provides important data that will help facilitate more widespread application of plasma medicine.

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Detached Glow Above a Titanium Hollow Cathode Sputter Source

Cited by 2 publications

References 6 publications

Enhanced extraction efficiency of the sputtered material from a magnetically assisted high power impulse hollow cathode

Enhanced extraction efficiency of the sputtered material from a magnetically assisted high power impulse hollow cathode

Characteristics of plasma in culture medium generated by positive pulse voltage and effects of organic compounds on its characteristics

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