2013
DOI: 10.3807/josk.2013.17.6.513
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Detecting Digital Micromirror Device Malfunctions in High-throughput Maskless Lithography

Abstract: Recently, maskless lithography (ML) systems have become popular in digital manufacturing technologies. To achieve high-throughput manufacturing processes, digital micromirror devices (DMD) in ML systems must be driven to their operational limits, often in harsh conditions. We propose an instrument and algorithm to detect DMD malfunctions to ensure perfect mask image transfer to the photoresist in ML systems. DMD malfunctions are caused by either bad DMD pixels or data transfer errors. We detect bad DMD pixels … Show more

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Cited by 2 publications
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“…Examinations of print relation and light field intensity in these axes have been rarer as fixed optics limits the user's scope for control. In optical design, the issue of most concern in the misalignment of pixels and beam skew rather than the impact of the field on the material properties of the resin [25][26][27] . Modelling the 2D light field has been attempted by a number of groups with the strategy of superimposing a series of Gaussian profiles corresponding to each 'on' pixel in the DMD 28,29 .…”
Section: Introductionmentioning
confidence: 99%
“…Examinations of print relation and light field intensity in these axes have been rarer as fixed optics limits the user's scope for control. In optical design, the issue of most concern in the misalignment of pixels and beam skew rather than the impact of the field on the material properties of the resin [25][26][27] . Modelling the 2D light field has been attempted by a number of groups with the strategy of superimposing a series of Gaussian profiles corresponding to each 'on' pixel in the DMD 28,29 .…”
Section: Introductionmentioning
confidence: 99%