2013
DOI: 10.1109/tsm.2013.2263295
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Detection of Micro-Arc Discharge Using ESC Wafer Stage With Built-In AE Sensor

Abstract: An electrostatic chuck (ESC) wafer stage with a built-in acoustic emission (AE) sensor is developed to detect micro-arc discharge occurring around a wafer. The built-in AE sensor detects acoustic waves caused by anomalous discharge with high sensitivity. The results demonstrate the effectiveness of this novel ESC wafer stage for detecting micro-arc discharge occurring around a wafer and will contribute greatly to improving the production yield of semiconductor manufacturing.Index Terms-Acoustic emission sensor… Show more

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Cited by 13 publications
(17 citation statements)
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“…Understandably, arc detection becomes even more challenging in the case of RF and VHF power supplies, due to the very high operational frequency of their output voltage or current. Therefore, in high-frequency systems different methods are utilized, such as: monitoring RF forward; reflected power [46]- [47], which requires the use of a directional coupler in the power supply; harmonics analysis [48], which requires the implementation of sophisticated signal processing circuits and an algorithm; or even an analysis of the acoustic emissions in the plasma chamber [49], which requires the use of additional probe systems.…”
Section: B Challenges and Requirements For Power Converters In Plasma Applicationsmentioning
confidence: 99%
“…Understandably, arc detection becomes even more challenging in the case of RF and VHF power supplies, due to the very high operational frequency of their output voltage or current. Therefore, in high-frequency systems different methods are utilized, such as: monitoring RF forward; reflected power [46]- [47], which requires the use of a directional coupler in the power supply; harmonics analysis [48], which requires the implementation of sophisticated signal processing circuits and an algorithm; or even an analysis of the acoustic emissions in the plasma chamber [49], which requires the use of additional probe systems.…”
Section: B Challenges and Requirements For Power Converters In Plasma Applicationsmentioning
confidence: 99%
“…Arcing, also called sparking or flashover, is known as a transient discharge and is a ubiquitous phenomenon in high-voltage applied systems ranging from ultra-high vacuum [1][2][3][4] to atmospheric pressure 5,6 . Since arcing itself is a high-density and high-temperature plasma that causes severe damage to material surfaces [7][8][9][10][11][12] , it has received enormous attention in research fields as well as industry for over 120 years 13 . Numerous studies have revealed arcing initiation mechanisms in direct current (DC) and radio frequency (RF) voltage environments in ultra-high vacuum, like field emission 14 and thermo-field electron emission 15 induced by a high electric field, which is on the order of several tens of GV/m and realized under circumstances of several tens of kV with micro-gaps 16 .…”
mentioning
confidence: 99%
“…For example, Aggelis et al [16] predicted the fatigue damage of metal plates by the rising time parameter of acoustic emission signal. Kasashima et al [17] measured the sensitivity of the built-in AE sensor via the AE energy consumption parameters. The rising time parameter reflects the AE signal changing rate, and the energy consumption parameter reflects the energy level of the AE signal.…”
Section: Introductionmentioning
confidence: 99%