Determination of beam incidence conditions based on the analysis of laser interference patterns

Wang, Dapeng; Wang, Zuobin; Yue, Yong; Yu, Juncai; Tan, Chunlei; Li, Dayou; Qiu, Renxi; Maple, Carsten

doi:10.1016/j.ijleo.2015.07.039

Cited by 6 publications

(5 citation statements)

References 20 publications

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“…To further verify the feasibility of the lithography method, the contrasts of the two-and four-beam TE 0 guided mode interference writing periodic structures were calculated using the following equation [27]:…”

Section: Simulation Resultsmentioning

confidence: 99%

Theoretical simulated fabrication of nanostructure by interference of four-beam guided mode excited by 193 nm laser

Di,

Yao,

Wang

et al. 2023

Phys. Scr.

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This study proposed a lithography method for fabricating periodic nanostructures using the interference of four-beam TE0 guided modes excited by a 193 nm deep ultraviolet laser. The physical mechanism and normalized electric field intensity distribution of four-beam TE0 guided mode interference were theoretically analyzed and numerically simulated using the finite element method. The simulation results confirmed the ability of this method to fabricate periodic structures with a half-pitch resolution of 30.35 nm (approximately λ/6.36), an aspect ratio of 3.95, and a contrast ratio of 1. The theoretically calculated value of the resolution was consistent with the numerical simulation value. The resolution and aspect ratio of the fabricated nanostructures could be adjusted through changes to the thickness of the resist. Moreover, the shape of the fabricated nanostructures, such as the one-dimensional sub-wavelength grating structure and two-dimensional square array lattice structure, were adjustable via changes to the number and azimuth of the excited TE0 guided modes. The results obtained in this study provide valuable theoretical information for the practical manufacture of ultra-high-resolution lithography.

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Section: Simulation Resultsmentioning

confidence: 99%

Theoretical simulated fabrication of nanostructure by interference of four-beam guided mode excited by 193 nm laser

Di,

Yao,

Wang

et al. 2023

Phys. Scr.

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“…Different patterns can be achieved by LIL via controlling the process parameters, such as incident angles of beams and wavelength, polarisation directions, laser fluencies and exposure durations. The period of the structures can be determined by the incident angles [73]. Nano gratings can be achieved by two-beam interference lithography.…”

Section: Laser Interference Lithographymentioning

confidence: 99%

Laser Interference Lithography for Applications in Biomedicine

2017

IFMBE Proceedings

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Surface modification of implant biomaterials has become the commonly used methods for the long life artificial implants and successful orthopaedic implantation. Numbers of technologies have been developed to improve the performances of artificial implants in biological systems. However, most of the technologies are associated with complex, time-consuming and not fully controllable processes, resulting in undesirable micro and nano structures. DLIL provides an effective method for nanomanufacturing of well-designed structures with controllability. The research reported in this thesis tackles the issues with particular focus on DLIL for the fabrication of well-designed micro and nano structures with functionalities including superhydrophobic, wear resistant property and biocompatibility on various biomaterials. Four-beam DLIL was developed to design and fabricate the micro and nano convex structures on silicon surfaces. Parameters such as incident angle, azimuthal angle and polarisation direction were adjusted to simulate micro patterns in period of 5.5 μm for structure design, and laser fluence and exposure duration were set to fabricate micro III PUBLISHED WORK AS PARTS OF THIS THESIS  Research described in Section 4.2 (Simulations and experiments of fabrication of superhydrophobic surfaces on silicon) and Section 4.3 (Results and discussions)

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“…DLIP has been demonstrated as a promising surface engineering tool for producing long-range well-defined high-resolution surface patterns with high throughput 9 . 2–5 beam DLIP is commonly used to grow patterned materials, such as in molecular-beam epitaxy reactors for nanolithography 10 – 12 . DLIP has mostly been demonstrated in vacuum or in low-pressure reactive gases environment.…”

Section: Introductionmentioning

confidence: 99%

Reactive laser interference patterning on titanium and zinc in high pressure CO2

Singh

Kumpulainen

Lahtonen

et al. 2022

Sci Rep

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Direct laser interference patterning (DLIP) is a versatile technique for surface patterning that enables formation of micro-nano sized periodic structures on top of the target material. In this study, DLIP in high pressure, supercritical and liquid CO2 by 4-beam DLIP was used to pattern titanium and zinc targets. Field emission scanning electron microscopy, atomic force microscopy, and X-ray photoelectron spectroscopy was used to characterize the patterned surfaces. Field emission SEM analysis showed presence of ordered uniform donut ring pattern with hollow centers for both titanium and zinc with a period slightly under 3 µm while topographical images from atomic force microscopy revealed donut rings protruding outwards typically around 200 nm from target surface and consisted of a crevice at the center with a depth typically around 300 nm and 250 nm for titanium and zinc target, respectively. Based on X-ray photoelectron spectroscopic analysis, this is the first study to report formation of TiO2, TiC, ZnCO3, and zinc hydroxy carbonate on the pattern by DLIP in supercritical and liquid CO2 for titanium and zinc targets. Pressurized CO2 is demonstrated as a promising environment with mirror-based DLIP system for reactive patterning. Due to the superior transport properties and solvent power of supercritical CO2, the current study opens possibilities for reactive patterning in environments that may not have been previously possible.

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Determination of beam incidence conditions based on the analysis of laser interference patterns

Cited by 6 publications

References 20 publications

Theoretical simulated fabrication of nanostructure by interference of four-beam guided mode excited by 193 nm laser

Theoretical simulated fabrication of nanostructure by interference of four-beam guided mode excited by 193 nm laser

Laser Interference Lithography for Applications in Biomedicine

Reactive laser interference patterning on titanium and zinc in high pressure CO2

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