Determination of Plasma Parameters from Thermal Probe Data

Matsuura, Hiroto; Jida, T.

doi:10.1002/ctpp.200610022

Cited by 9 publications

(10 citation statements)

References 4 publications

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“…Energy flux to a substrate was measured by many researchers using variety of thermal probes (TPs) in the past in the RF plasma [32][33][34][35][36][37], RF magnetron plasma [38,39], and DC grow discharge plasma [40].…”

Section: Measurement Of Spatial Distribution Of Heat Flux To the Subsmentioning

confidence: 99%

“…Thus, we have made several TPs with the help of many references [32][33][34][35][36][37][38][39][40] different ways: steady state operation or pulse operation depending on the "plasma on" time duration. In the steady state operation, plasma is turned on much longer than the thermal relaxation time of the TP, and the temperature gradient (∆T/ ∆x) on the TP is measured after the TP is thermally equilibrated.…”

Section: Measurement Of Spatial Distribution Of Heat Flux To the Subsmentioning

confidence: 99%

See 1 more Smart Citation

Deposition of Aluminum-Doped ZnO Films by ICP-Assisted Sputtering

Matsuda

Hirashima

Mine

et al. 2013

ZnO Nanocrystals and Allied Materials

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Inductively coupled plasma (ICP) assisted DC sputter-deposition was used for the deposition of Al-doped ZnO (AZO or ZnO:Al) thin films. With increasing ICP RF power, film properties including deposition rate, crystallinity, transparency and resistivity were improved. To understand the plasma-surface interaction, several plasma diagnostics were performed. Heat fluxes to the substrate were measured by thermal probes, number densities of sputtered metallic atom species were measured by absorption spectroscopy using hollow cathode lamps (HCL) and light emitting diodes (LEDs), and neutral gas temperatures were measured by external cavity diode laser (ECDL) absorption spectroscopy. As a result, it was revealed that the high density ICP heated the substrate through a high heat flux to the substrate, resulting in a high quality film deposition without the need for intentional substrate heating.The heat flux to the substrate was predominantly contributed by the plasma charged species, not by the neutral Ar atoms which were also significantly heated in the ICP. The substrate position where the highest quality films were obtained was found to coincide with the position where the substrate heat flux took the maximum value.

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Section: Measurement Of Spatial Distribution Of Heat Flux To the Subsmentioning

confidence: 99%

Section: Measurement Of Spatial Distribution Of Heat Flux To the Subsmentioning

confidence: 99%

Deposition of Aluminum-Doped ZnO Films by ICP-Assisted Sputtering

Matsuda

Hirashima

Mine

et al. 2013

ZnO Nanocrystals and Allied Materials

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show abstract

“…According to sheath theory, the momentum and heat flux through the sheath are also functions of the sheath potential drop. Recently, a combined force Mach Langmuir probe [1] and a thermal probe [2,3] were proposed to measure these fluxes and to obtain not only electron parameters but also ion information, such as temperature. The first result of ion temperature measurement with a thermal probe were reported recently in [4], but the importance of the energy reflection coefficient in thermal probe measurement is noted in [5].…”

Section: Introductionmentioning

confidence: 99%

Measurement of Edge Plasma Heat Flux in Heliotron J Using a Thermal Probe

Matsuura

Nakano

Hosaka

et al. 2010

Plasma and Fusion Research

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Direct measurement of divertor heat flux is an important task. However, heat flux calibration is often difficult because heat diffusion in sensors takes longer than the discharge duration of present experiments. In this paper, using an unsteady heat conduction model, the heat flux in the Heliotron J edge plasma is measured for the first time. The obtained heat flux value, although it is time averaged, is positively correlated with plasma heating power, more precisely, with plasma internal energy. The angular distribution of heat flux around the probe axis shows a profile shape similar to previously reported probe current distributions.

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“…The energy flux to the substrate can be directly measured by using a thermal probe (TP) [2][3][4][5][6][7][8][9][10] in different ways. One is the method that uses the difference in the rising and falling rate of TP temperature during the plasma on and off periods, in which the heat capacity of the TP has to be calibrated.…”

Section: Introductionmentioning

confidence: 99%

“…Energy flux onto a substrate has been measured with different TPs by many researchers in the RF plasma [2][3][4][5][6][7], RF magnetron plasma [8,9], and DC grow discharge plasma [10] in the past. However, no measurement of the energy flux onto the substrate during the ICP assisted sputtering has been done as far as we know so far.…”

Section: Introductionmentioning

confidence: 99%

Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition

Kitagawa

Kan

Mine

et al. 2010

TENCON 2010 - 2010 IEEE Region 10 Conference

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Abstract-Substrate energy flux in the inductively coupled plasma (ICP) assisted magnetron discharge has been measured by using a home-made thermal probe. The energy flux depends predominantly on the ICP power. In addition, substrate bias dependence of the substrate energy flux has been measured. As a result, it has been confirmed that the measured heat influx in an ICP is in good agreement with the theoretically calculated value within 30% error. Thus, substrate energy flux during the ICP assisted sputtering is quantitatively clarified.

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Determination of Plasma Parameters from Thermal Probe Data

Cited by 9 publications

References 4 publications

Deposition of Aluminum-Doped ZnO Films by ICP-Assisted Sputtering

Deposition of Aluminum-Doped ZnO Films by ICP-Assisted Sputtering

Measurement of Edge Plasma Heat Flux in Heliotron J Using a Thermal Probe

Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition

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