2010
DOI: 10.1016/j.jeurceramsoc.2009.09.003
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Determination of residual stress in PZT films produced by laser ablation with X-ray diffraction and Raman spectroscopy

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Cited by 29 publications
(9 citation statements)
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“…Equations (18) and (19) are the empirical model to determine equibiaxial residual stresses. In order to verify the above model, Xu et al estimated the residual stress in the mechanically polished fused quartz beam.…”
Section: Xu Modelmentioning
confidence: 99%
See 1 more Smart Citation
“…Equations (18) and (19) are the empirical model to determine equibiaxial residual stresses. In order to verify the above model, Xu et al estimated the residual stress in the mechanically polished fused quartz beam.…”
Section: Xu Modelmentioning
confidence: 99%
“…Various experimental techniques have been developed to measure the residual stresses in materials, such as X-ray diffraction, 14 hole-drilling, 15 layer removal, 16 neutron diffraction, 17 synchrotron, 18 Raman spectroscopy, 19 ultrasonic method, 20 and magnetic method. 21 However, these methods all have some problems.…”
Section: Introductionmentioning
confidence: 99%
“…In the multilayer piezoelectric/ferroelectric devices, such as MLPAs and multilayer ceramic capacitors (MLCCs), as the coefficients of thermal expansion for the internal metal electrodes is larger than that of the ceramic layers, compressive residual stresses are generated during manufacturing process . As observed in other perovskite ferroelectric/ferroelastic materials, tensile stress moves the Raman shift upward, whereas compressive stress has a reverse effect . The variation in Raman shift indicates that the residual stress released during the crack development.…”
Section: Resultsmentioning
confidence: 99%
“…2 Pb(Zr x Ti 1 À x )O 3 (PZT) thin film is considered to be an important ferroelectric thin film due to the potential applications in many fields for its high piezoelectric coefficients, and preferable ferroelectric properties. 3 Residual stress is inevitable for the structural misfit, thermal misfit, and the process from high temperature to low temperature during deposition of thin film, and it can significantly change mechanical, optical, and electrical properties, domain structure formation and the nature of phase transition in ferroelectric films.…”
Section: Introductionmentioning
confidence: 99%
“…4,5 Much research has shown that the tensile residual stress could induce the surface crack in film while the compressive residual stress may cause the film delamination from the substrate. 4 Several techniques such as x-ray diffraction (XRD), 2,4 Raman spectroscopy, 2,5 nano-indentation fracture method, 6 the bulge test, and the point deflection method 7 were developed to measure residual stresses in ferroelectric thin films. X-ray diffraction provides one of the non-destructive methods of measuring residual stresses.…”
Section: Introductionmentioning
confidence: 99%