2021
DOI: 10.1007/s10854-021-05863-0
|View full text |Cite
|
Sign up to set email alerts
|

Determination of surface morphology and electrical properties of MoO3 layer deposited on GaAs substrate with RF magnetron sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
4
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
7

Relationship

1
6

Authors

Journals

citations
Cited by 9 publications
(4 citation statements)
references
References 53 publications
0
4
0
Order By: Relevance
“…In this respect, MoO 3 also acts as a hole transport layer (HTL) in SC. Also, in our previous studies, we have structural and morphological investigations for MoO 3 thin film 31 , 32 . In order to improve the absorption by reducing the transparency in the FTO/SnO 2 /CdS/CdTe/MoO 3 SC, the photonic band gap in the structure is designed with 1D-PC, which consist of MgF 2 and MoO 3 have different dielectric constants and therefore different refractive indices.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…In this respect, MoO 3 also acts as a hole transport layer (HTL) in SC. Also, in our previous studies, we have structural and morphological investigations for MoO 3 thin film 31 , 32 . In order to improve the absorption by reducing the transparency in the FTO/SnO 2 /CdS/CdTe/MoO 3 SC, the photonic band gap in the structure is designed with 1D-PC, which consist of MgF 2 and MoO 3 have different dielectric constants and therefore different refractive indices.…”
Section: Resultsmentioning
confidence: 99%
“…The materials excluding the metallization parts were deposited using the RF sputter technique in the SCs examined in the study. The RF sputter technique provides homogeneous and thickness-controlled deposition for CdTe, CdS, and other metal-oxide alloys at the desired stoichiometric ratio 19 , 30 , 31 , 33 35 . In addition, in our previous study, we found that the optical calculations we made with TMM on the devices we produced by deposition with the RF sputter technique showed a nearly perfect agreement with the experiment 19 .…”
Section: Resultsmentioning
confidence: 99%
“…In equation (11), ε o is the dielectric permittivity of the vacuum, N A and qV o are the concentration of the acceptor atoms and the built-in potential respectively. While N A and V o values can be reckoned by fitting the linear of C −2 -V plot, E F , E m , Φ B (C-V), and W D can be reckoned with the following expressions [7]; ( )…”
Section: Impedance Measurement (Z-v ) Resultsmentioning
confidence: 99%
“…Improving the electronic properties and performance of the Schottky devices due to their various application areas through the transistors to solar cells is the focus of many studies reported in the literature [1][2][3][4][5][6][7]. Besides, SiO 2 and SnO 2 interfacial layers, which have been used frequently between metal and semiconductor until today, cannot whole saturate the active dangling-bonds at the surface, which has led to the demand for the use of various interfaces between metal and semiconductor [7][8][9][10][11][12][13][14][15][16][17][18][19]. Due to their low expenditure and ease of production, using polymer materials as an interlayer in the fabrication of MS devices has become one of the intriguing research areas.…”
Section: Introductionmentioning
confidence: 99%