2008
DOI: 10.1103/physrevb.77.045316
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Determination of the branch-point energy of InN: Chemical trends in common-cation and common-anion semiconductors

Abstract: Bulk and surface electronic properties of Si-doped InN are investigated using high-resolution x-ray photoemission spectroscopy, optical absorption spectroscopy, and quasiparticle corrected density functional theory calculations. The branch point energy in InN is experimentally determined to lie 1.83± 0.10 eV above the valence-band maximum. This high position relative to the band edges is used to explain the extreme fundamental electronic properties of the material. Far from being anomalous, these properties ar… Show more

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Cited by 109 publications
(64 citation statements)
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“…24 If the BPE is situated close to the CBM/VBM, the formation of donor/acceptor native defects becomes favorable. 25 One can align the energy bands of different semiconductors using the BPE. The band alignment of wurtzite (wz) ZnO and ZnAl 2 O 4 spinel is shown in Fig.…”
Section: Band Alignment and Conductivitymentioning
confidence: 99%
“…24 If the BPE is situated close to the CBM/VBM, the formation of donor/acceptor native defects becomes favorable. 25 One can align the energy bands of different semiconductors using the BPE. The band alignment of wurtzite (wz) ZnO and ZnAl 2 O 4 spinel is shown in Fig.…”
Section: Band Alignment and Conductivitymentioning
confidence: 99%
“…Therefore, a surface electron accumulation is expected for In content exceeding 40%, while a surface depletion is expected for the rest of the composition values. This effect has been experimentally confirmed by King et al using X-ray photoemission spectroscopy [Veal 2006, King 2008b.…”
Section: Effect Of Native Defects On the Intrinsic N-type Dopingsupporting
confidence: 54%
“…In addition, the electron (n(z)) and hole (p(z)) concentration variation in the near-surface region of each case is shown. Taken from [King 2008b]. …”
Section: Effect Of Native Defects On the Intrinsic N-type Dopingmentioning
confidence: 99%
“…Group III nitrides are among the most promising optoelectronic materials because they possess excellent intrinsic properties such as a wide range of direct transition-type energy bandgaps from 6.2 eV for AlN [1,2] to 0.6-0.8 eV for InN [3][4][5][6], strong bond between nitrogen and each group III atom, high thermal conductivity, high electron saturation velocity [6][7][8][9], and several others. As such, these materials offer various promising applications in high-efficiency light emitting diodes (LEDs), laser diodes (LDs), photodiodes (PDs) operating in visible and ultraviolet (UV) regions, as well as highpower electronic devices.…”
Section: Introductionmentioning
confidence: 99%