2017
DOI: 10.1007/s11664-017-5589-3
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Determining and Controlling the Magnesium Composition in CdTe/CdMgTe Heterostructures

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Cited by 13 publications
(6 citation statements)
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“…In search of a suitable p-type window layer, previously Magnesium (Mg) incorporated CdTe (CdTe:Mg), a ternary compound has been grown by ED which demonstrated a p-type electrical conductivity along with a bandgap of ~ 2.80 eV 20 . The reason to choose Mg to incorporate to the CdTe layer was mainly that Magnesium Telluride (MgTe) has shown a very small (0.7%) lattice mismatch with CdTe and demonstrated a higher bandgap 21 , 22 . However, the layers exhibited a dramatic collapse of crystallinity with the incorporation of Mg and have been seen to give rise to an intermediate defect level at ~ 1.45 eV which may potentially pin the Fermi level and lower the barrier height.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…In search of a suitable p-type window layer, previously Magnesium (Mg) incorporated CdTe (CdTe:Mg), a ternary compound has been grown by ED which demonstrated a p-type electrical conductivity along with a bandgap of ~ 2.80 eV 20 . The reason to choose Mg to incorporate to the CdTe layer was mainly that Magnesium Telluride (MgTe) has shown a very small (0.7%) lattice mismatch with CdTe and demonstrated a higher bandgap 21 , 22 . However, the layers exhibited a dramatic collapse of crystallinity with the incorporation of Mg and have been seen to give rise to an intermediate defect level at ~ 1.45 eV which may potentially pin the Fermi level and lower the barrier height.…”
Section: Introductionmentioning
confidence: 99%
“…P + and n + layers act as electron back diffusion barrier (ebdb) layer (or Hole Transport Layer-HTL), and hole back diffusion barrier (hbdb) layer (or Electron Transport Layer-ETL) respectively. bandgap 21,22 . However, the layers exhibited a dramatic collapse of crystallinity with the incorporation of Mg and have been seen to give rise to an intermediate defect level at ~ 1.45 eV which may potentially pin the Fermi level and lower the barrier height.…”
mentioning
confidence: 99%
“…In conjunction with optimization techniques for material processing such as post-growth annealing, tailoring the Mg content and dopants, leads to material's properties that can meet specific requirements of a given application. 11 At room temperature, the bandgap of Cd1-xMgxTe grows linearly with x at a rate of around 15 meV per Mg atomic percent, 12 beginning with the bandgap energy of CdTe, which is 1.503 eV. Figure 2, for illustrative purposes, presents pictures of CMT single-crystal wafers with different Mg concentrations (x values).…”
Section: Cd1-xmgxte Crystal Growthmentioning
confidence: 99%
“…In order to obtain structures with a different strain, we have changed the content of magnesium in the buffer layer and the barrier layer (see table I). The magnesium content was deduced based on magnesium fluxes and calibration obtained by the reflectance measurements 29,30 . The nominal width of (Cd, Mn)Te QW was 10 nm.…”
Section: A Samplesmentioning
confidence: 99%