Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV 2021
DOI: 10.1117/12.2584040
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Determining the validity domain of roughness measurements as a function of CD-SEM acquisition conditions

Abstract: In the effort of continuously improving patterning strategies for increasing circuit density while reducing dimensions, several challenges regarding patterning fidelity emerge. In recent years, stochastic effects had their relative importance increased, and therefore the need for closely monitoring those effects is also increasing [1]. Among other stochastic effects, within-feature roughness is significant as it can impact circuit electrical behavior, decreasing time and power performance, and even lead to fai… Show more

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Cited by 2 publications
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“…In this article, we have employed the methods in the article [1] as a foundational reference for the comparison of the two contours with articles [6], [5], [2] serving as the point of reference for calculating roughness.…”
Section: Framework For Distance Between Two Contours and Roughnessmentioning
confidence: 99%
“…In this article, we have employed the methods in the article [1] as a foundational reference for the comparison of the two contours with articles [6], [5], [2] serving as the point of reference for calculating roughness.…”
Section: Framework For Distance Between Two Contours and Roughnessmentioning
confidence: 99%