2019
DOI: 10.1021/acs.nanolett.9b02598
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Deterministic Nanoassembly of Quasi-Three-Dimensional Plasmonic Nanoarrays with Arbitrary Substrate Materials and Structures

Abstract: Guided manipulation of light through periodic nanoarrays of three-dimensional (3D) metal–dielectric patterns provides remarkable opportunities to harness light in a way that cannot be obtained with conventional optics yet its practical implementation remains hindered by a lack of effective methodology. Here we report a novel 3D nanoassembly method that enables deterministic integration of quasi-3D plasmonic nanoarrays with a foreign substrate composed of arbitrary materials and structures. This method is versa… Show more

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Cited by 12 publications
(8 citation statements)
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“…(3) Multiple orientations of the BCP nanodomain can be fabricated on a single substrate as not only the BCP nanodomain's vertical/parallel orientation but a direction of lateral ordering can be controlled. Our novel BCP graphoepitaxy process can be applicable to the large-scale production of next-generation electronic, optoelectronic, and energy devices that require various nanometer-scale patterns [35][36][37][38][39].…”
Section: Discussionmentioning
confidence: 99%
“…(3) Multiple orientations of the BCP nanodomain can be fabricated on a single substrate as not only the BCP nanodomain's vertical/parallel orientation but a direction of lateral ordering can be controlled. Our novel BCP graphoepitaxy process can be applicable to the large-scale production of next-generation electronic, optoelectronic, and energy devices that require various nanometer-scale patterns [35][36][37][38][39].…”
Section: Discussionmentioning
confidence: 99%
“…In this direction, the modular approach discussed above is also applicable here. Moreover, besides conventional micromachining methods [9], researchers are pushing towards methods such as transfer printing [124] or deterministic nano-assembly [125]. In the particular case of graphene, wafer-level manufacturing and integration at the graphene qualities required for metasurface applications remains as an outstanding challenge.…”
Section: Technologymentioning
confidence: 99%
“…Traditionally, the fabrication of these plasmonic nanoantennas has primarily relied on the use of conventional nanolithography techniques by exploiting either electron-beam, focused ion-beam, nanoimprint, or interference lithography on a rigid, flat wafer. Despite great successes over the past decades, these approaches are limited by the laborious, complex, and time-consuming nature of the nanolithography techniques, thereby impeding their application in wide-ranging use. Recently, we demonstrated a proof-of-concept methodology that enables the physical transfer of quasi-3D metal–dielectric hybrid nanoarchitectures from their donor Si molds to a foreign receiver substrate (e.g., photodetectors) in a time- and cost-effective manner . However, this method, as well as any other similar method, has never been applicable to infrared (IR) filters due to the inherent extreme brittleness of IR-transparent dielectric spacers, such as SU-8 (i.e., fracture strain = 2–3%) …”
Section: Introductionmentioning
confidence: 99%