Deuterated Diamond Like Carbon films (DDLC): Mechanical properties in relation with microstructure

Mathis, Nicolas; Meunier, C.; Guibert, G.; Mikhailov, S.; Berthout, G.

doi:10.1016/j.surfcoat.2007.09.034

Cited by 5 publications

(3 citation statements)

References 25 publications

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“…For the P–PPAa film deposited at 80 V negative bias voltage, the positive ions in the plasma are accelerated toward the growing film, and thus create more dangling bonds and active sites in respect to a coating grown on a non ground electrode, which leads to the increased cross‐linking and close‐knit structure of the film. Especially, at the beginning of deposition, accelerated positive ions drastically interacts on the deeper surface of the substrate, which results in the enhanced adhesion between the as‐deposited film and the substrate,28 and the critical scratch load L c is 81.05 mN. Furthermore, the functional groups such as COOH, NH 2 , and OH can interact specifically with metal atoms,29 thus, abundant NH 2 of the P–PPAa film seems to be a key factor to promote adhesion to the 316L SS substrate.…”

Section: Resultsmentioning

confidence: 99%

Pulsed‐Plasma Polymeric Allylamine Thin Films

Yang

Wang

et al. 2009

Plasma Processes & Polymers

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High surface functional groups concentration, excellent dynamical stability and mechanical properties are ideal for biomedical plasma polymers. Herein, we report a simple and effective approach to fabricating such an ideal plasma polymeric allylamine film on 316L stainless steel (SS) by pulsed plasma polymerization. The experimental results show that the concentration of the primary amine groups (NH2/C) of the plasma polymeric allylamine film was 2.4 ± 0.4%. The plasma polymeric allylamine film possesses not only high surface NH2 concentration, but also high cross‐linking degree and close‐knit network structure that could well resist hydrolysis, and dissolution in the aqueous solution. Furthermore, the plasma polymeric allylamine film was used as a stent coating that shows a good resistance to the deformation behaviour of compression and expansion of the stent.

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Section: Resultsmentioning

confidence: 99%

Pulsed‐Plasma Polymeric Allylamine Thin Films

Yang

Wang

et al. 2009

Plasma Processes & Polymers

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“…In our previous study and another study examining the properties of a-C:D films, the hardnesses of the a-C:D films were lower than that of the a-C:H film even if the sp 2 /sp 3 ratios of these films were the same, suggesting that the void structures of these films might be different [13][14][15]. However, the void structures of the a-C:D and a-C:H films have not been investigated.…”

Section: Introductionmentioning

confidence: 82%

Effect of incorporation of deuterium on vacancy-type defects of a-C:H films prepared by plasma CVD

Ozeki

Sekiba

Uedono

et al. 2015

Applied Surface Science

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“…Meunier et al reported that under vacuum conditions ta-C films show an extremely short sliding lifetime as compared to the a-C:H films which are related to the material composition and particularly their hydrogen content. In these diamond-like films, the content of hydrogen is larger than the sp3 bonding …”

Section: Introductionmentioning

confidence: 99%

Multiscale Surface Microtexture Analysis of CuNPs@a-C:H Thin Films

Solaymani

Kulesza

Nezafat

et al. 2020

Ind. Eng. Chem. Res.

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The sputtered copper nanoparticles (Cu NPs) on amorphous hydrogenated carbon films (CuNPs@a-C:H) were deposited on a glass substrate by the codeposition method of radio-frequency (RF)-sputtering and RF-plasma-enhanced chemical vapor deposition methods. The thin films were synthesized in different deposition times of 10, 15, 20, and 25 min while other parameters were constant. Rutherford back scattering measurements specified the atomic content of the thin films while the localized surface plasmon resonance peak was extracted from the UV–visible spectra. To investigate surface images, an atomic force microscope in noncontact mode was used to give valuable information for the stereometric, fractal, and particle analyses. The surface topography was computed based on the ISO 25178–2:2012 standard and the Abbott-Firestone curves; polar graphs were plotted for additional statistical information on the surface microtexture. The autocorrelation function and three-dimensional (3-D) surface texture interpreted surface topography, anisotropy ratio, and functional properties which help optimize the thin film’s functional performance. The X-ray diffraction profile which was applied to investigate the crystalline structure confirmed copper as the major structural component with Cu(111) and Cu(002) peaks, the intensities of which were increased with the deposition time. Finally, particle analyses were applied to confirm the previously obtained results.

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Deuterated Diamond Like Carbon films (DDLC): Mechanical properties in relation with microstructure

Cited by 5 publications

References 25 publications

Pulsed‐Plasma Polymeric Allylamine Thin Films

Pulsed‐Plasma Polymeric Allylamine Thin Films

Effect of incorporation of deuterium on vacancy-type defects of a-C:H films prepared by plasma CVD

Multiscale Surface Microtexture Analysis of CuNPs@a-C:H Thin Films

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