Development, experimental performance and damage properties of x-ray optics for the LCLS free-electron laser

Soufli, Régina; Fernández-Perea, Mónica; Krzywiński, J.; Rich, David; Baker, Sherry L.; Robinson, Jeffrey A.; Hau‐Riege, Stefan P.; Gullikson, Eric M.; Yashchuk, Valeriy V.; McKinney, Wayne R.; Heimann, Philip; Schlotter, W. F.; Rowen, M.; Montanez, P.; Boutet, Sébastien

doi:10.1117/12.2019197

Cited by 3 publications

(1 citation statement)

References 21 publications

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“…The substrate materials of monocrystalline silicon coating with low-Z materials, such as boron carbide (B 4 C) and silicon carbide (SiC), are mostly used as X-ray mirror in the Materials 2024, 17, 1026 2 of 13 international light source. In addition, the metals with high Z are also considered as the coating materials, such as rhodium and ruthenium [13,14]. Under the irradiation of highenergy X-ray, the mirror materials will be easily damaged.…”

Section: Introductionmentioning

confidence: 99%

The Influence of B4C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror

Sui,

Zhuo,

Tang

et al. 2024

Materials

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The uniformity and consistency of X-ray mirror film materials prepared by experimental methods are difficult to guarantee completely. These factors directly affect the service life of free electron laser devices in addition to its own optical properties. Therefore, the quality of the film material, especially the density, has a critical effect on its application. Boron carbide film and monocrystalline silicon substrate were suitable examples to explore their influence of density on the damage threshold based on Monte Carlo and heat-conduction methods. Through simulation results, it was found that the change in film density could affect the energy deposition depth and damage threshold. When the film density was 2.48 g/cm3, it had relatively high damage threshold in all energy ranges. And then the specific incident parameter for practical application was investigated. It was found that the damage mechanism of the B4C/Si was the melting of the interface. And the damage threshold was also higher with the film density of 2.48 g/cm3. Therefore, it was recommended to maintain the density at this value as far as possible when preparing the film, and to ensure the uniformity and consistency of the film material.

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Section: Introductionmentioning

confidence: 99%

The Influence of B4C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror

Sui,

Zhuo,

Tang

et al. 2024

Materials

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Fluence thresholds for grazing incidence hard x-ray mirrors

Aquila

Sobierajski

Özkan

et al. 2015

Applied Physics Letters

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X-ray Free Electron Lasers (XFELs) have the potential to contribute to many fields of science and to enable many new avenues of research, in large part due to their orders of magnitude higher peak brilliance than existing and future synchrotrons. To best exploit this peak brilliance, these XFEL beams need to be focused to appropriate spot sizes. However, the survivability of X-ray optical components in these intense, femtosecond radiation conditions is not guaranteed. As mirror optics are routinely used at XFEL facilities, a physical understanding of the interaction between intense X-ray pulses and grazing incidence X-ray optics is desirable. We conducted single shot damage threshold fluence measurements on grazing incidence X-ray optics, with coatings of ruthenium and boron carbide, at the SPring-8 Angstrom compact free electron laser facility using 7 and 12 keV photon energies. The damage threshold dose limits were found to be orders of magnitude higher than would naively be expected. The incorporation of energy transport and dissipation via keV level energetic photoelectrons accounts for the observed damage threshold.

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