Development of a dc, broad beam, Mevva ion source

Brown, Ian; Dickinson, M.R.; Galvin, James E.; MacGill, R.A.

doi:10.1063/1.1142948

Cited by 26 publications

(10 citation statements)

References 16 publications

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“…Still the results are very encouraging, suggesting extrapolation to a high current device should be possible. To provide some feeling for the performance of this new ion source we compared its key characteristics to a wide variety of other types of ion sources, based on four key articles (Fitch, 1971;Lobanov, 1994;Brown, 1992;Takahashi, 1996). It was found that the magnetic-index approach in the ILLIBS configuration exhibits several advantages over other ion gun designs: simpler design, higher extraction efficiency; 10 ((mA/cm 2 )/W), lower divergence; 10.8 ± 0.36 mrad, and a very intensive ion flux; 6 x 10 18 ions/(cm 2 .sec) measured at 0.27 Pa.…”

Section: Discussionmentioning

confidence: 99%

RF Ion Gun Injector in Support of Fusion Ship II Research and Development

Miley

Shaban²,

Yang³

2004

AIP Conference Proceedings

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Abstract. Ion injection into the Inertial Electrostatic Confinement (IEC) fusion power plant used in the design of the high performance Fusion Ship II (Burton et al., 2003) is a key technological issue for development of this concept. This paper discusses the design and initial experiments with a radiofrequency (RF) ion gun designed for this purpose. The RF Gun design described here was found to have some important advantages over other ion gun designs: simple construction, a higher extraction efficiency; 10 ((mA/cm 2 )/W), a lower divergence; 10.8 ± 0.36 mrad, and a very intensive ion flux; 6 x 10 18 ions/(cm 2 .sec) measured at 0.27 Pa.

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Section: Discussionmentioning

confidence: 99%

RF Ion Gun Injector in Support of Fusion Ship II Research and Development

Miley

Shaban²,

Yang³

2004

AIP Conference Proceedings

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“…We've made several broad beam source versions, including our 10-cm "workhorse" source that we use for our routine ion implantation work [5,16], a 20-cm source that we used to test d.c. ion 5 beam extraction [5,17,18], and a source having a 50 cm diameter (2000 cm2) extractor 15,181. A photograph of the very large area extractor grids is shown in Figure 1.…”

Section: Very Large Area Beam Productionmentioning

confidence: 99%

“…Broad beam operation is advantageous because of its simplicity. The essential feature of this kind of ion source is that the plasma is allowed to expand to large size prior to beam formation, preferably in a configuration such that the transverse plasma density distribution, and hence also the ion beam current profile, is relatively flat.We've made several broad beam source versions, including our 10-cm "workhorse" source that we use for our routine ion implantation work [5,16], a 20-cm source that we used to test d.c. ion 5 beam extraction [5,17,18], and a source having a 50 cm diameter (2000 cm2) extractor 15,181. A photograph of the very large area extractor grids is shown in Figure 1.…”

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confidence: 99%

Recent advances in vacuum arc ion sources

Brown

Anders

et al. 1996

Surface and Coatings Technology

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Intense beams of metal ions can be formed fiom a vacuum arc ion source. This kind of source works well for most of the solid metals of the periodic table, and because the ions are in general multiply stripped with charge states as high as 4+ to 6+, the mean energy of the ion beam produced can be 100 -200 keV for extractor voltage in the comfortable range of about 50 -75 kV. Broadbeam extraction is convenient, and the time-averaged ion beam current delivered downstream can readily be in the tens of milliamperes range. The vacuum arc ion source has for these reasons found good .application for metallurgical surface modification -it provides relatively simple and inexpensive access to high dose metal ion implantation. Several important source developments have been demonstrated recently, including very broad beam operation, macroparticle removal, charge state enhancement, and formation of gaseous beams. We have made a very broad beam source embodiment with beam formation electrodes 50 cm in diameter (area 2000 cm2), producing a beam of width -35 cm for a nominal beam area of -1000 cm2, and a pulsed Ti beam current of about 7 A was formed at a mean ion energy of -100 keV. Separately, we've developed high efficiency macroparticle-removing magnetic filters and incorporated such a filter into a vacuum arc 1 ion source so as to form macroparticle-free ion beams. Jointly . IntroductionThe vacuum arc metal ion source provides a convenient and relatively inexpensive tool for carrying out metal ion implantation in a mode that is suitable for many different kinds of surface modification applications. High current beams of metal ions are formed from the dense, highly ionized metal plasma that is generated by a vacuum arc discharge embodied within the ion source configuration. The plasma physics of ion production in vacuum arc plasmas [l-41 and the approaches taken for incorporating this kind of plasma within an ion source 15-81 have been described in detail elsewhere. Vacuum-arc-based ion sources have been developed at many laboratories around the world [5,9], mostly for ion implantation and particle accelerator injection.As the subfield has grown and attracted workers to the area, so also the range of application variations, hardware embodiments, and performance objectives has expanded. Sources have been developed from very small up to quite large systems and with ion beam currents from a few milliamperes up to several amperes. More recently, a number of novel and advantageous source developments have been made. Here we report on several of these advances that are of particular relevance to ion implantation application. In the following, we firstly briefly review the fundamental characteristics of vacuum arc ion sources, and then describe some of the specific advances made together with the ion beam characterization results obtained . BackgroundThe vacuum arc ion source is, in essence, simplicity itself. A vacuum arc plasma source, typically but not necessarily of cylindrical symmetq and repetitively pulsed, is ap...

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“…Large source embodiments [2,6], on the other hand, call for well-designed water cooling if the beam current is to be as large as it can be. If a multi-cathode design is to be used, the concern of accomplishing good cooling of the multiple cathode assembly while retaining its freedom to rotate requires some careful thought.…”

mentioning

confidence: 99%

“…-A DC suwce has been made and tested [2,6]. For steady state operation, very good cooling is required of both the gun assembly (anode and cathode) as well as the extractor.…”

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confidence: 99%

Vacuum arc ion sources—Micro to macro

MacGill

Dickinson

Brown

1996

Review of Scientific Instruments

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Vacuum arc ion sources provide a convenient tool for the production of intense beams of metal ions. The sources are relatively easy to construct and they can produce beams from all of the solid metals as well as from compounds, alloys, and mixtures. We have made a number of different kinds of such sources over the course of our development work at LBL in the past decade, from very small ‘‘thumb-size’’ versions to a very large one with a 50 cm diameter extractor. Beam current ranges from a few milliamperes up to almost 10 A and extraction voltage from about 1 to 100 kV. Multicathode versions have been made so that one can switch between metal ion species simply and quickly. Most of the sources have been operated in a repetitively pulsed mode, and we’ve also tested a dc version. Here we outline some construction features of the array of vacuum arc ion sources that we’ve developed and used, and describe their performance and limitations.

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Development of a dc, broad beam, Mevva ion source

Cited by 26 publications

References 16 publications

RF Ion Gun Injector in Support of Fusion Ship II Research and Development

RF Ion Gun Injector in Support of Fusion Ship II Research and Development

Recent advances in vacuum arc ion sources

Vacuum arc ion sources—Micro to macro

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