Development of a magnetic hybrid material capable of photoinduced phase separation of iron chloride by shape memory and photolithography

Abstract

FeCl3 in the polymer matrix can be partially ordered using photolithography. Ordered FeCl3 has improved magnetic susceptibility.

Skillful Control of Dispersion and 3D Network Structures: Advances in Functional Organic–Inorganic Nano-Hybrid Materials Prepared Using the Sol-Gel Method

“…In other words, the magnetic nanoparticles require the development of technology to control the phase separation process during the dispersion of the nanoparticles, i.e., the magnetic properties need to be improved by clustering the nanoparticles together. Ikake et al [85] have developed a method to control the phase separation by combining the photoinduced phase transition and shape-memory processes (Figure 7). However, the sol-gel method also faced the problem that the high dispersion and random orientation of titania did not allow a sufficient magnetic susceptibility to be achieved for use as a magnetic lithography substrate.…”

“…In other words, the magnetic nanoparticles require the development of technology to control the phase separation process during the dispersion of the nanoparticles, i.e., the magnetic properties need to be improved by clustering the nanoparticles together. Ikake et al [85] have developed a method to control the phase separation by combining the photoinduced phase transition and shape-memory processes (Figure 7). We found that UV irradiation of the highly dispersed magnetic ionic liquid TBP [FeCl 4 ] in a polymer matrix causes phase separation of the FeCl 3 particles, which coincidentally align along the polymer chain when the polymer chain is uniaxially stretched.…”

“…(h) Magnetometry measurements of Ti15TB40Fe5 after UV irradiation (green plot) and the shape-memory process (blue plot). From ref [85]…”

Macroscopic Property Evaluation of Titania Nanocomposite Polymer Capable of Drawing Double-Network Macrostructure Using Photolithography

“…To introduce double-network polymers into a normal molding process, it is beneficial to generate cross-linking points after the molding process. The modular patterning of films using photoreactions can add cross-linking points after deposition. − For example, Clet et al demonstrated a precise microscale patterning to modify the modulus of silicone elastomers . Furthermore, Sugimoto et al reported that by designing heat-cross-linking and photo-cross-linking parts, an increase in the Young’s modulus by more than 2 orders of magnitude was achieved by performing a photo-cross-linking process after a normal elastomer manufacturing heat process .…”