2010
DOI: 10.1016/j.jmatprotec.2010.02.001
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Development of a nanostructure microstructure in the Al–Ni system using the electrospark deposition process

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Cited by 34 publications
(15 citation statements)
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“…where C is the capacitance in Farad (F) and V is the voltage in Volt (V); while F is the discharge frequency in Hertz (Hz) [26]. In Table 2 are shown the values of the spark pulse Energies used for processing the samples whereas increasing values of the V, C, and F subscript indicate increasing values of the respective parameters.…”
Section: Methodsmentioning
confidence: 99%
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“…where C is the capacitance in Farad (F) and V is the voltage in Volt (V); while F is the discharge frequency in Hertz (Hz) [26]. In Table 2 are shown the values of the spark pulse Energies used for processing the samples whereas increasing values of the V, C, and F subscript indicate increasing values of the respective parameters.…”
Section: Methodsmentioning
confidence: 99%
“…Among them, there are Fe-based alloys [21], superalloys [22][23][24], and magnesium alloys [25]. Heard and Brochu [26] determined that ESD is a feasible method of producing an aluminum-nickel deposit, consisting of a nano-structured Al3Ni phase. Cadney and Brochu [27] investigated the feasibility of using the ESD process to deposit amorphous electrode material (Zr41.2Ti13.8Ni10Cu12.5Be22.5) onto an amorphous substrate of the same composition without crystallizing the deposit or the substrate.…”
Section: Introductionmentioning
confidence: 99%
“…Indeed, the thickness increases with deposition pulse energy, ranging from 82.6 µm for the deposit produced at the lowest energy to 407.6 µm for the deposit produced at the highest E s . This is due to the increased amount of material being transferred at higher spark energy (E s ) [41], that rises the deposit growth rate (GR). Therefore, for a given number of deposited layers, the increasing of E s , lead also to a reduced deposition time.…”
Section: Effect Of the Electric Parameters On Mechanical Properties Amentioning
confidence: 99%
“…More recently, these coatings were oxidized by using a DC plasma oxidation technique to grow alumina films, which despite being the metastable gamma alumina, it presented very good barrier properties [59]. Lower interest has been devoted to the Ni-Al system where instead pure alloyed layers, Ni-Cr-NiAl [60] and Al-NiAl 3 [61], have been produced.…”
Section: Electrospark Depositionmentioning
confidence: 99%