Development of a Novel Instrument for X-Ray Photoelectron Diffraction and Holography

Abstract

For X-ray photoelectron diffraction (XPED) and holography measurements we developed a novel laboratory instrument with the multienergy high power X-ray source and the high energy and high angular resolution photoelectron spectrometer system. The photon intensities of Al-Kα, Cr-Lα and Cu-Kα were estimated at 4.6×10 11 cps, 7.5×10 10 cps and 7.2×10 10 cps, respectively. Ag3d XPS also revealed that the energy resolutions of Al-Kα and Cr-Lα sources were 0.9 eV and 3.1 eV, respectively. XPS and XPED of h-BN/Ni(111) excited by Al-Kα and Cr-Lα elucidated the potential and the validity of the XPED and holography analysis by using this novel instrument. Cu-Kα excitation XPS and Ti1s XPED measurements of the SrTiO3 (001) surface have also been performed.

Development of photoelectron spectro‐holography apparatus

“…All photoelectrons of Ag could be attributed to these two components, the ratios of which are ¾2. In previous work 10 we also found two components of Ti 1s from an SrTiO 3 (001) surface. Because the 128-channel RAE could not detect photoelectrons with a kinetic energy of >3.2 keV, other photoelectrons could not be measured.…”

“…The photoelectron spectra obtained were similar to those measured in previous work. 10 Because of a higher dark level, we could not detect Ti 2p with enough precision to measure the Ti 2p XPED pattern. The Ti 1s XPED patterns, which were obtained by measuring the angular distribution of only Ti 1s photoelectrons excited by Cu K˛1, are shown in Fig.…”

“…To realize this method in laboratories, we have been developing a photoelectron spectro-holography apparatus 10 by combining two different apparatuses: the multi-energy highintensity x-ray source 11,12 and the high-performance photoelectron analyser with a diffraction plane aperture lens. 13 -15 We performed high-performance XPED measurements by using Al K˛ h D 1486.8 eV and Cr L˛ h D 572.8 eV high-power sources of this apparatus.…”

Surface structure analysis of Zr‐O/W(100) at high temperature by x‐ray photoelectron diffraction

“…6 The apparatus can realize low-energy electron diffraction (LEED), XPS and XPD measurements at high temperature. The vacuum pressure of the chamber is ¾10 8 Pa and Al K˛radiation is used for excitation in XPS and XPD measurements.…”

“…Although the work function of the W(100) surface is 4.6 eV, that of the Zr-O/W(100) surface at 1700 K is 2.6 eV. Moreover, the performance of its electron emission is stable even at a high pressure of 10 6 Pa. There are some reports of studies on the surface structure of the Zr-O/W(100) emitter.…”