Development of a Plasma Diagnostic Method for High Power Pulsed Magnetron Sputtering Using a Reflectron-Type Time-of-Flight Mass Spectrometer

Sanekata, Masaomi; Tsukamoto, Keizou; Misaizu, Fuminori

doi:10.5702/massspec.s22-06

Cited by 3 publications

(2 citation statements)

References 33 publications

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“…[23][24][25] On the other hand, the sputtering and plasma processes in DOMS have only recently begun to be revealed in a few papers. 22,26) In a DOMS discharge, we measured the time evolution of ions produced in the deposition area at 100 mm away from the target surface by using a time-of-flight mass spectrometer developed for HPPMS, 27,28) and found a transition from gas plasma to metallic plasma, which corresponds to the plasma build-up observed in pulsed DC sputtering. 29,30) DOMS research has the advantage of observing plasma build-up as a pulse-bypulse evolution process unique to DOMS.…”

Section: Introductionmentioning

confidence: 99%

Optical emission spectroscopy in deep oscillation magnetron sputtering (DOMS) of titanium

Yokoyama

Sanekata

Nishimiya

et al. 2023

Jpn. J. Appl. Phys.

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Optical emission spectroscopic diagnostics is applied to determine the temporal evolution and distance dependence from the target surface for deep oscillation magnetron sputtering (DOMS) with a titanium target. In the time evolution of emission intensities for atomic lines of optically emitting species formed in DOMS plasma, the envelope of the peak emission intensity for sputtered neutrals in each pulsed discharge was observed to rise gradually with increasing distance. The increase in the distance dependence of the optical emission corresponds to plasma build-up from gas plasma to metallic plasma which has been reported in the deposition region using a time-of-flight mass spectrometer in J. Appl. Phys. 131, 243301 (2022). On the other hand, the ion confinement effect was strongly observed for sputtered ions in the region up to the edge of the magnetic trap around 40 mm downstream from the target surface for the first pulse discharge.

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Section: Introductionmentioning

confidence: 99%

Optical emission spectroscopy in deep oscillation magnetron sputtering (DOMS) of titanium

Yokoyama

Sanekata

Nishimiya

et al. 2023

Jpn. J. Appl. Phys.

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“…One should notice that this might occur only if there were no beam energy filtering before the MA instrument, e.g. in the case of using magnetic sector (as in our work) or timeof-flight [33][34][35][36] analyzers. The absence of energy filtering can be regarded as a drawback of these instruments.…”

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confidence: 99%

Evidence of 1000 eV positive oxygen ion flux generated in reactive HiPIMS plasma

Kolodko

Ageychenkov

Lisenkov

et al. 2023

Plasma Sources Sci. Technol.

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Arrival of highly energetic (near 1000 eV) positive atomic oxygen ions to the substrate region has been detected in a unipolar reactive HiPIMS process operated with uncooled copper target in argon–oxygen mixtures. Examination of ion fluxes from discharge plasma was performed with a magnetic sector mass-spectrometer and an electrostatic energy analyzer. The energy of fast positive O+ ions is close to the value of eVd (e—elementary charge, Vd—discharge voltage) that indicates their connection to well-studied fraction of negative O– ions, which undergo acceleration in the cathode sheath. After switching the oxygen gas supply off, the flux of energetic O+ species decreases gradually as the poisoned target surface layers become depleted of oxygen due to sputtering in pure argon. Presumably, the observed energetic O+ ions originate as a result of low-angle scattering of fast negative O– ions from other charged or neutral species in plasma followed by electron detachment, ionization, or charge exchange.

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Time-of-flight mass spectrometry diagnostics in deep oscillation magnetron sputtering (DOMS) of titanium

Sanekata

Nakagomi

Hirayama

et al. 2022

Journal of Applied Physics

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Reflectron-type time-of-flight mass spectrometry was applied to the time-resolved component analysis of deep oscillation magnetron sputtering (DOMS), which has been developed as a technique of modulated pulsed magnetron sputtering. In the present study, the DOMS of a Ti target was performed under an Ar gas atmosphere by using a DOMS-specific control waveform consisting of 25 current and/or power pulses. The time evolution of the formation of ionized species (Ar+, Ar2+, Ti+, and Ti2+) after the application of the first discharge pulse was observed at the position corresponding to the deposition region. This study revealed that the plasma build-up process from non-metallic plasma to metallic plasma takes approximately two micropulses (around 100 μs from ignition) in DOMS discharge. In addition, we have found the possibility of studying sputtering processes, such as the rarefaction, and refilling processes of Ar as a function of pulse number through DOMS research.

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Development of a Plasma Diagnostic Method for High Power Pulsed Magnetron Sputtering Using a Reflectron-Type Time-of-Flight Mass Spectrometer

Cited by 3 publications

References 33 publications

Optical emission spectroscopy in deep oscillation magnetron sputtering (DOMS) of titanium

Optical emission spectroscopy in deep oscillation magnetron sputtering (DOMS) of titanium

Evidence of 1000 eV positive oxygen ion flux generated in reactive HiPIMS plasma

Time-of-flight mass spectrometry diagnostics in deep oscillation magnetron sputtering (DOMS) of titanium

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