2009
DOI: 10.1016/j.sna.2008.11.009
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Development of a wide-tuning range and high Q variable capacitor using metal-based surface micromachining process

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Cited by 7 publications
(2 citation statements)
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“…Variable capacitors are key elements in many electronic devices due to their ability to provide a wide tuning range (Wan and Lowther, 2007). Their fabrication has been usually based on microelectromechanical system (MEMS) technologies in order to fabricate capacitors with varying cantilever length (Luo et al, 2006), or glass-based doublecross-type variable capacitor (Huang et al, 2009), or ultrathin silicon wafers, SU-8 bonding and deep reactive ion etching micromachined based variable capacitor with parallel plates (Xiao et al, 2003) or vertical cantilever based variable capacitor fabricated using deep C-ray lithography and electroplating (Achenbach et al, 2007). However, abovementioned micromachined capacitors have been usually fabricated using either masks process or additional postprocessing steps, which are both costly and time consuming.…”
Section: Introductionmentioning
confidence: 99%
“…Variable capacitors are key elements in many electronic devices due to their ability to provide a wide tuning range (Wan and Lowther, 2007). Their fabrication has been usually based on microelectromechanical system (MEMS) technologies in order to fabricate capacitors with varying cantilever length (Luo et al, 2006), or glass-based doublecross-type variable capacitor (Huang et al, 2009), or ultrathin silicon wafers, SU-8 bonding and deep reactive ion etching micromachined based variable capacitor with parallel plates (Xiao et al, 2003) or vertical cantilever based variable capacitor fabricated using deep C-ray lithography and electroplating (Achenbach et al, 2007). However, abovementioned micromachined capacitors have been usually fabricated using either masks process or additional postprocessing steps, which are both costly and time consuming.…”
Section: Introductionmentioning
confidence: 99%
“…A RF varactor for 7.8 GHz VCO application was developed by Heves et al (2008). Huang et al (2009) developed a dual-electrode varactor for RF applications using Al/Cr. Elshurafa and El-Masry (2010) developed MEMS parallel-plate variable capacitors with customizable tuning range.…”
Section: Introductionmentioning
confidence: 99%