2020
DOI: 10.1021/acsomega.9b03805
|View full text |Cite
|
Sign up to set email alerts
|

Development of an AlCl3-Urea Ionic Liquid for the Electroless Deposition of Aluminum on Carbon Nanotubes

Abstract: Unlike the easy electroless deposition of other metals, the deposition of aluminum can be challenging. This is because the standard reduction potential of aluminum lies outside the electrochemical window (EW) of water. Ionic liquids such as AlCl 3 -1-ethyl-3-methylimidazolium chloride (EMIC) have been used because of their wide EW. Here, we introduce a novel ionic liquid for electroless deposition of aluminum by reacting AlCl 3 and urea, with lithium aluminum hydride (LAH) as a reducing agent. Additionally, we… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
4
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 7 publications
(5 citation statements)
references
References 34 publications
1
4
0
Order By: Relevance
“…6g). Al 2p and Cl 2p spectra indicate the presence of Al-Cl species [12,68], likely to be AlCl 4 − as reported widely in RAB [15,69].…”
Section: Full-cellsupporting
confidence: 61%
“…6g). Al 2p and Cl 2p spectra indicate the presence of Al-Cl species [12,68], likely to be AlCl 4 − as reported widely in RAB [15,69].…”
Section: Full-cellsupporting
confidence: 61%
“…Although research using these solvent systems is primarily driven by electrochemical applications, ,,,, interest in them for EL processes is increasing. Several such examples have been cited throughout this article, including galvanic deposition of Al onto U using a AlCl 3 -EMIC RTIL (Aluminum section), EL Bi deposition onto Cu using an ethaline DES (Bismuth section), galvanic Re deposition onto Cu, Ni, or steel substrates using reline DES (Rhenium section), and galvanic Sn deposition onto Cu substrates using a ChCl-thiourea DES (Tin section), among others. ,,,,, …”
Section: Discussionmentioning
confidence: 99%
“…More recent work has demonstrated the applicability of these EL Al baths for plating various substrates, such as Ni nanowires 595 and Pd/Sn colloid-catalyzed CNTs. 596 Several other baths for Al deposition have also been subsequently described. For example, Shen et al 597 deposit an epitaxial Al film having an electrical resistivity close to that of bulk Al onto a Pt surface via decomposition of triethylamine alane at ∼105−120 °C in 4-methylanisole solution containing added N,N-dimethyloctylamine as a stabilizing agent.…”
Section: Acs Appliedmentioning
confidence: 99%
See 1 more Smart Citation
“…Feng et al [145] prepared Ag-coated MWCNTs using a formaldehyde as the reducing agent. Mohammed et al [146] fabricated Al-coated MWCNTs from an AlCl 3 -urea ionic liquid using a lithium aluminum hydride as the reducing agent.…”
Section: Other Metal-coated Cntsmentioning
confidence: 99%