Development of atomic layer deposition-activated microchannel plates for single particle detection at cryogenic temperatures

Gorelikov, D.; Sullivan, Neal T.; Rouffignac, Philippe de; Li, Huazhi; Narayanamoorthy, Jayasri; Tremsin, Anton S.

doi:10.1116/1.4862947

Cited by 6 publications

(3 citation statements)

References 21 publications

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“…If the resistance is too high, the conductive layer cannot replenish electrons to the emission layer in time and continuously, the MCP will have low gains or even fail to operate. On the other hand, if the resistance is too low, the MCP will overheat, eventually leading to a breakdown [ 4 , 9 , 14 , 15 ]. Hence, the design of the conductive layer is of importance for an ALD-MCP.…”

Section: Introductionmentioning

confidence: 99%

The Design of the AZO Conductive Layer on Microchannel Plate

et al. 2021

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When the resistivity of the AZO conductive layer is within the MCP resistance requirement, the interval of the Zn content is very narrow (70–73%) and difficult to control. Aiming at the characteristics of the AZO conductive layer on the microchannel plate, an algorithm is designed to adjust the ratio of the conductive material ZnO and the high resistance material Al2O3. We put forward the concept of the working resistance of the MCP (i.e., the resistance during the electron avalanche in the microchannel). The working resistance of AZO-ALD-MCP (Al2O3/ZnO atomic layer deposition microchannel plate) was measured for the first time by the MCP resistance test system. In comparison with the conventional MCP, we found that the resistance of AZO-ALD-MCP in working state and non-working state is very different, and as the voltage increases, the working resistance significantly decreases. Therefore, we proposed a set of analytical methods for the conductive layer. We also proposed to adjust the ratio of the conductive material of the ALD-MCP conductive layer to the high-resistance material under the working resistance condition, and successfully prepared high-gain AZO-ALD-MCP. This design opens the way for finding better materials for the conductive layer of ALD-MCP to improve the performance of MCP.

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Section: Introductionmentioning

confidence: 99%

The Design of the AZO Conductive Layer on Microchannel Plate

et al. 2021

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“…If the bulk resistance is too low, the temperature will rise to an excessive level, causing MCP failure. Conversely, if the bulk resistance is too high, the conducting layer may not be able to replenish electrons to the emitting layer in a timely and continuous manner, leading to a reduction in MCP gain or even complete failure [11]. Elam et al utilized ALD technology to prepare the MCP dynode, with ZnO/Al 2 O 3 (AZO) selected as the conductive layer.…”

Section: Introductionmentioning

confidence: 99%

Uniformity of AZO conductive film on microchannel plate by atomic layer deposition and effect of annealing on bulk resistance

Zhu,

Xu,

et al. 2023

Mater. Res. Express

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AZO(ZnO/Al2O3) conductive films were deposited in the microchannel of microchannel plate (MCP) by atomic layer deposition (ALD). The prepared films were characterized, including analysis of the thickness and composition uniformity of AZO films. The MCP bulk resistance was also measured, and the effect of annealing treatment on bulk resistance was investigated. The results suggest that the use of trimethylaluminum in the preparation of AZO composite film within the microchannel of MCP leads to corrosion of ZnO, resulting in non-uniformity in film thickness and incorrect composition of the film. The problem was resolved by increasing the pulse time of trimethylaluminum to 500 ms, resulting in the successful preparation of an AZO film with a uniform thickness and composition in the microchannel. After annealing, the bulk resistance of MCP increases while the variation of bulk resistance with voltage decreases. Specifically, the bulk resistance of the MCP having a ZnO/Al2O3 ratio of 7/2 only experiences changes of the same order of magnitude (~108 Ω) after undergoing a 60-minute annealing process in N2 at 300 ℃, thus satisfying the requirements of MCP.

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“…A GCA thus functionalized is referred to as a Micro-Channel Plate (MCP). The MCPs are shown to have a low background rate, high gain, and high spatio-temporal resolution [11,12] and have a variety of potential applications, including neutrino detection, mass spectroscopy, and light image intensifiers [13][14][15].…”

Section: Introductionmentioning

confidence: 99%

Imaging of large-area microchannel plates using phosphor screens

et al. 2014

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A testing system was built, using UV illumination at 254 nm and a cathodoluminescent phosphor screen, to measure the gain uniformity of large area (20 × 20 cm2) microchannel plates. The phosphor screen image is captured with a wide-angle CMOS digital camera (4032 × 3024 pixels) and analyzed. First a reference MCP is illuminated and the generated phosphor screen image is captured with a CCD camera. In a second step, another image is captured with the MCP under test inserted between the reference MCP and the phosphor screen. The ratio of the two images is analyzed and provides a quantitative measure of the relative gain uniformity of the MCP under test.

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Development of atomic layer deposition-activated microchannel plates for single particle detection at cryogenic temperatures

Cited by 6 publications

References 21 publications

The Design of the AZO Conductive Layer on Microchannel Plate

The Design of the AZO Conductive Layer on Microchannel Plate

Uniformity of AZO conductive film on microchannel plate by atomic layer deposition and effect of annealing on bulk resistance

Imaging of large-area microchannel plates using phosphor screens

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