2004
DOI: 10.1016/s0168-9002(04)01662-6
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Development of bipolar-pulse accelerator for intense pulsed ion beam acceleration

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Cited by 5 publications
(2 citation statements)
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“…In this approach, ion implantation is accompanied with selective high-temperature annealing of the ion-implanted layer. Test devices were constructed with BPA as the acceleration power source (voltage: ±200 kV, pulse width: 70 ns [full width half maximum, FWHM]) and gas puff plasma gun used as the ion source, and preliminary experiments were conducted to verify the effectiveness of BPA [20,21]. Although hydrogen, aluminum, and other ion beams with purity about 90% were generated successfully, the beam purity is still insufficient for ion implantation, which requires ion beams with purity of 99% or higher.…”
Section: Introductionmentioning
confidence: 99%
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“…In this approach, ion implantation is accompanied with selective high-temperature annealing of the ion-implanted layer. Test devices were constructed with BPA as the acceleration power source (voltage: ±200 kV, pulse width: 70 ns [full width half maximum, FWHM]) and gas puff plasma gun used as the ion source, and preliminary experiments were conducted to verify the effectiveness of BPA [20,21]. Although hydrogen, aluminum, and other ion beams with purity about 90% were generated successfully, the beam purity is still insufficient for ion implantation, which requires ion beams with purity of 99% or higher.…”
Section: Introductionmentioning
confidence: 99%
“…Thus, bipolar pulse accelerator (BPA) [19] was proposed as a novel accelerator to further improve beam purity. Test devices were constructed with BPA as the acceleration power source (voltage: ±200 kV, pulse width: 70 ns [full width half maximum, FWHM]) and gas puff plasma gun used as the ion source, and preliminary experiments were conducted to verify the effectiveness of BPA [20,21]. In this study, we report the characteristics of pulsed ion beams using first pulse (negative pulse) of bipolar pulse voltage as the progress of BPA development.…”
Section: Introductionmentioning
confidence: 99%