Development of EUPS for analyzing electronic states of topmost atomic layer

Improved water oxidation activity of a Sillén SrBi3O4Cl3 photocatalyst by flux method with an appropriate binary-component molten salt

“…S10 †). Further, the suppression of the Cl defects on the surface of the ux sample was supported by extreme UV-excited photoelectron spectroscopy (EUPS) measurement [36][37][38] (Fig. S11 †).…”

Strong Metal–Support Interaction Mechanisms of Rh Supports in the CO–NO Reaction: Rh/Rh2O3 Interconversion in Promoting NO Dissociation and CO2 Generation

“…The Rh 4d and Ce 4f valence band spectra were measured using EUPS, which was developed at the National Institute of Advanced Industrial Science and Technology (AIST, Tokyo, Japan). During EUPS, a sample was excited for 3 ns using a 4.86 nm (255 eV) pulse of extreme ultraviolet light emitted by laser-produced plasma, and the photoelectron spectrum was analyzed using a time-of-flight (TOF) analyzer . During TOF analysis, all electrons, regardless of their energies, are detected based on one-shot excitation, yielding a spectrum over the entire energy range in principle.…”

“…During EUPS, a sample was excited for 3 ns using a 4.86 nm (255 eV) pulse of extreme ultraviolet light emitted by laser-produced plasma, and the photoelectron spectrum was analyzed using a time-of-flight (TOF) analyzer. 18 During TOF analysis, all electrons, regardless of their energies, are detected based on one-shot excitation, yielding a spectrum over the entire energy range in principle. Signals based on multishot excitation are accumulated to reduce noise.…”