Development of EUV multilayer mirrors for astronomical observation in IPOE

Abstract

Three kinds of multilayer mirrors were developed for solar observation and earth's magnetosphere observation at Extreme Ultraviolet (EUV) wavelength region. The first one is Mo/Si multilayer mirror, designed for solar Fe-XII emission line at wavelength of 19.5nm. The reflectivities are in the range of 38.7~42.9%, measured at National Synchrotron Radiation Laboratory (NSRL), Hefei, China. The second high-reflective multilayer is designed for solar He-II radiation at 30.4 nm. At this wavelength, SiC/Mg multilayers were investigated, and as high as 50.0% measured reflectivity was obtained at incident angle of 10˚. Aperiodic SiC/Mg multilayers were also designed for wide angular ranges of 15-22˚ and 12-21˚. The third multilayer mirror was a dual-function mirror used for earth's magnetosphere observation, which requires high-reflective for He-II emission line at wavelength of 30.4nm but low-reflectance at 58.4nm from ionosphere He-I emission. Using aperiodic SiC/Mg multilayer stack, the dual-function multilayer mirror was designed by genetic algorithm. Compared to periodic multilayer, the dual-function multilayer suppresses the reflectivity for He-I at 58.4nm from 2.2% to 0.1%, without loss of the reflection for He-II at 30.4nm, significantly. These multilayer mirrors were all prepared by magnetron sputtering system in IPOE, and measured at NSRL, China.