Development of full-size EUV pellicle with thermal emission layer coating

Hong, Juhee; Park, Chulkyun; Lee, Changhun; Nam, Kyoung Won; Jang, Yong-Ju; Wi, Seong Ju; Ahn, Jinho

doi:10.1117/12.2501772

Cited by 7 publications

(3 citation statements)

References 3 publications

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“…Therefore, thermomechanical stability to prevent breakage is one of the key issues. Simulations show that the pellicle temperature increases to more than 500 C in some cases (Hong et al 2018). It gives constraints to the input power of the light source.…”

Section: Pelliclesmentioning

confidence: 99%

Advances in Optics and Exposure Devices Employed in Excimer Laser/EUV Lithography

Suzuki¹

2020

Handbook of Laser Micro- And Nano-Engineering

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Semiconductor lithography currently provides a resolution close to 10 nm, with the aim of producing extremely fine patterning. Over the last decade, lithography techniques have progressed from ArF immersion to multiple patterning to extreme ultraviolet lithography (EUVL) operating at a wavelength of 13.5 nm. During this period, the first-generation lithography devices were immersion systems and achieved 40 nm resolution through a 1.35 numerical aperture (NA) projection lens in conjunction with an ArF laser (operating at 193 nm) and water immersion. To make full use of the capability of the projection lens, A. Suzuki (*) Head quarter, AS Lithography Consulting

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Section: Pelliclesmentioning

confidence: 99%

Advances in Optics and Exposure Devices Employed in Excimer Laser/EUV Lithography

Suzuki¹

2020

Handbook of Laser Micro- And Nano-Engineering

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“…11) Thirdly, thermal stability is imperative, considering that EUV light exposure can heat the pellicle to temperatures as high as 1000 °C due to its short wavelength of 13.5 nm. 12) Lastly, the pellicle must demonstrate chemical resistance to active hydrogen species generated by EUV exposure. In EUV scanners, hydrogen is used to remove carbon deposition, generating active hydrogen species to decompose deposited carbon.…”

Section: Introductionmentioning

confidence: 99%

EUV durability of CNT pellicles for next-generation scanner

Ueda,

Lima,

Harada

et al. 2024

Jpn. J. Appl. Phys.

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The pellicle plays a crucial role in the extreme ultraviolet (EUV) photolithography process and has garnered increased attention from advanced semiconductor manufacturers as they strive to advance development for smaller process nodes. Carbon nanotubes (CNTs) are highly promising for EUV pellicle applications due to their exceptional mechanical, thermal, and optical properties. It is necessary for the pellicle to be durable and robust enough to withstand extreme scanner conditions, which involve combinations of high temperatures and active hydrogen species generated by EUV light.In this study, we present test results conducted to simulate the environment of the next-generation 600W scanner using the NewSUBARU synchrotron light source facility. Our investigation focused on evaluating the performance of CNT films, both with and without protective coating layers. Surprisingly, the results indicate that the CNT film without coating demonstrated the most promising characteristics for pellicle applications, showcasing superior performance in the demanding EUV scanner environment.

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“…8) Thirdly, the pellicle must exhibit exceptional thermal stability as it will be exposed to temperatures as high as 1000 °C that are generated by EUV radiation. 9) Finally, the pellicle must be resistant to hydrogen etching, a potential hazard resulting from ionized and atomic hydrogen inside the EUV scanner. [10][11][12] Carbon nanotube (CNT) is the material that can satisfy these requirements simultaneously, emerging as the most promising pellicle fabrication material.…”

Section: Introductionmentioning

confidence: 99%

CNT-based pellicles for the next generation of EUV scanners

Ueda¹,

Lima²,

Harada

et al. 2023

Jpn. J. Appl. Phys.

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There has been growing interest among advanced semiconductor manufacturers in pellicles that can withstand conditions in extreme ultraviolet (EUV) photolithography. The pellicle must have high mechanical toughness, high transparency in EUV radiation, thermal stability, and chemical stability for ionized and atomic hydrogen. For the above expectations, our experience shows that the carbon nanotube (CNT) yields the most promising results due to its outstanding mechanical and thermal properties. We are developing thin, free-standing CNT films for EUV pellicle application using a liquid filtration manufacturing method. This method has the advantage of producing highly uniform films, allowing us to use a variety of CNT types, while avoiding the use of harsh chemicals. To advance our hypothesis, we will examine and discuss EUV radiation durability results evaluated with the NewSUBARU synchrotron light facility.

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Development of full-size EUV pellicle with thermal emission layer coating

Cited by 7 publications

References 3 publications

Advances in Optics and Exposure Devices Employed in Excimer Laser/EUV Lithography

Advances in Optics and Exposure Devices Employed in Excimer Laser/EUV Lithography

EUV durability of CNT pellicles for next-generation scanner

CNT-based pellicles for the next generation of EUV scanners

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