2004
DOI: 10.1117/12.536846
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Development of high-power ArF/F 2 laser platform for VUV microlithography

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Cited by 8 publications
(2 citation statements)
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“…By nature of operating with high voltage, high gas pressures, reactive halogen gas, and high energy laser light, excimer lasers require maintenance such as consumable part replacements to stay within tight performance requirements. While advancements in hardware and software reduce the need for human intervention, ultimately, to maximize laser uptime and performance, it requires proactive planning of laser maintenance needs and operational settings by field service engineers 1,2,3 . For the engineer to make optimal maintenance choices, it often requires estimating future internal performance of the laser, the impact of each consumable part and their interactions, the impact of operational settings and their interactions, and the optimal timing for each maintenance event.…”
Section: Introductionmentioning
confidence: 99%
“…By nature of operating with high voltage, high gas pressures, reactive halogen gas, and high energy laser light, excimer lasers require maintenance such as consumable part replacements to stay within tight performance requirements. While advancements in hardware and software reduce the need for human intervention, ultimately, to maximize laser uptime and performance, it requires proactive planning of laser maintenance needs and operational settings by field service engineers 1,2,3 . For the engineer to make optimal maintenance choices, it often requires estimating future internal performance of the laser, the impact of each consumable part and their interactions, the impact of operational settings and their interactions, and the optimal timing for each maintenance event.…”
Section: Introductionmentioning
confidence: 99%
“…In the field of electronic industry, technologies like the precision manufacturing of modern semiconductor devices and high-resolution lithography (such as 193,157, and 13.5 nm lithography) have become the main driving force for VUV detectors' development (Kakizaki et al, 2004;Li et al, 2017;Richter et al, 2002;Smith and Suzuki, 2018). Precise control of the exposure dose is the key to achieving high-quality lithography, so an excellent VUV detector is required to monitor the real-time energy of single laser pulse accurately (Richter et al, 2002) (Figure 1D).…”
Section: Introductionmentioning
confidence: 99%