Development of Novel Photo-sensitive Light-shielding Bank with High Reflectivity for Next-generation Display

Abstract

A new display with quantum dot color filter (QD-CF) is attracting attention as a nextgeneration display. The QD-CF display can achieve high brightness, definition and contrast. It is essential for QD-CF structure to form "banks" separating QD materials.In this paper, we introduce the novel photo-sensitive light-shielding banks with high reflectivity, which are suitable for QD-CF display. This bank material contains both TiO 2 pigment and UV transparent black pigment. The material can form gray banks which have a thickness of 10 μm with a good taper angle of 86°. The banks show good light-shielding property (transparency@450 nm<1%), high reflectivity of 50.8% at 550 nm, and high heat resistance (1% weight loss temperature is 353 o C). This developed material is ideal for application of QD-CF display.

Development of Photo-sensitive Siloxane Coatings with High Light-diffusion

“…In addition, this layer requires high transparency, good light resistance, and patternability to form a wiring connection area for application to image displays. Previously, we developed siloxane with a high transparency and high light resistance [3][4][5], and recently, we mass-produced functional composite materials with positive-tone photosensitive siloxane and inorganic filler [6]. In this paper, we introduce novel coatings composed of positive-tone photosensitive siloxane and a light-diffusion filler (TiO 2 or ZrO 2 ).…”