High refractive index (RI) thin films
are of critical importance
for advanced optical devices, and the high refractive index polymers
(HRIPs) constitute an interesting class of materials for high RI thin
films due to low cost, good processability, light weight, and high
flexibility. However, HRIPs have yet to realize their full potential
in high RI thin film applications due to their relatively low RI,
strong absorption in the blue light region, and limited film formation
methods such as rapid vitrification. Herein, we report a development
of a new HRIP thin film generated through a one-step vapor-phase process,
termed sulfur chemical vapor deposition (sCVD), using elemental sulfur
and divinyl benzene. The developed poly(sulfur-co-divinyl benzene) (pSDVB-sCVD) film exhibited RI (measured at 632.8
nm) exceeding 1.97, one of the highest RIs among polymers without
metallic elements reported to date. Because the sCVD utilized vaporized
sulfur with a unique sulfur-cracking step, formation of long polysulfide
chains was suppressed efficiently, while high sulfur content as high
as 85 wt % could be achieved with no apparent phase separation. Unlike
most of inorganic high RI materials, pSDVB-sCVD was highly transparent
in the entire visible range and showed extremely low birefringence
of 10 × 10–4. The HRIP thin film with unprecedentedly
high RI, together with outstanding transparency and low birefringence,
will serve as a key component in a wide range of high-end optical
device applications.