“…Low-temperature plasma processing at reduced pressure uses sufficiently clean process gases, the base pressure of which must be below 0.01 Mbar (achieved using a two-stage vacuum pump, prevacuum, rotary, vane type, oil-free ("clean") pump, or a combination of these pumps with vacuum) (Spyrides, Alencastro, Guimaraes, Bastian, Simao, 2019;Firouzi, Ching, Rizvi, Selvaganapathy, 2019;Kumar, Yap, Samsudin, Khan, Srinivasa, 2016;Rajendra Prasad, Prakash, Manjunath, 2007;Sergeeva, Zheltukhin, Abdullin, 2011).…”