2015
DOI: 10.7567/jjap.55.01af01
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Development of plasma-on-chip: Plasma treatment for individual cells cultured in media

Abstract: A device consisting of Si microwells and microplasma sources has been fabricated for plasma treatment of individual cells cultured in media. We named the device plasma-on-chip. The microwells have through-holes at the bottom where gas–liquid interfaces form when they are filled with media containing biological samples. The microplasma sources, which supply reactive species, are located on the back of each microwell. Through the gas–liquid interface, the reactive species are supplied to the cells. Chlorella cel… Show more

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Cited by 19 publications
(19 citation statements)
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“…Arrays of through-holes were fabricated in a 200-μm-thick Si substrate (22 mm × 22 mm) by a deep reactive ion etching technique (etching depth: 200 μm) 32 . Three different sizes (50 μm × 50 μm, 100 μm × 100 μm, and 200 μm × 200 μm) of through-hole arrays were created, with distances between the through-holes of 150 μm, 300 μm, and 600 μm, respectively.…”
Section: Resultsmentioning
confidence: 99%
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“…Arrays of through-holes were fabricated in a 200-μm-thick Si substrate (22 mm × 22 mm) by a deep reactive ion etching technique (etching depth: 200 μm) 32 . Three different sizes (50 μm × 50 μm, 100 μm × 100 μm, and 200 μm × 200 μm) of through-hole arrays were created, with distances between the through-holes of 150 μm, 300 μm, and 600 μm, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…It is readily understood that the plasma affects cells in the vicinity of the treated area. Figure 1 illustrates what occurs when the plasma irradiation area is reduced to a size as small as a cell (plasma ≒ cell) or smaller (plasma < cell) 30 31 32 33 34 . In these cases, we expect that the plasma treatment activates or inactivates biological reactions at the single-cell level.…”
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confidence: 99%
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