Development of release agent-free replica mould material for ultraviolet nanoimprinting

Otsuka, Yuma; Hiwasa, Shin; Taniguchi, Jun

doi:10.1016/j.mee.2014.09.001

Cited by 27 publications

(16 citation statements)

References 13 publications

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“…After fabricating the first replica mold, mold release treatment was performed on its surface for improving the mold release. Specifically, 10-nm-thick Pt was deposited on the mold surface, and the mold was then immersed in Optool DSX 0.1% (Daikin Co., Ltd., Osaka, Japan) for 24 h. Later, heating was performed at 85 °C for 30 min to make the fluorinated hydrocarbon chains on the mold surface face upward [ 20 ]. The mold was then rinsed for 1 min with Optool HD-TH (Daikin Co., Ltd., Osaka, Japan).…”

Section: Methodsmentioning

confidence: 99%

Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

2020

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Ultraviolet nanoimprint lithography (UV-NIL) requires high durability of the mold for the mass production of nanostructures. To evaluate the durability of a line-patterned replica mold made of high-hardness UV curable resin, repetitive transfer and contact angle measurements of the replica mold were carried out. In the line patterns, as the contact angle decreases due to repeated transfer, capillary action occurs, and water flows along them. Therefore, it can be said that a mold with a line pattern exhibits an anisotropic contact angle because these values vary depending on the direction of the contact angle measurement. Subsequently, these anisotropic characteristics were investigated. It was determined that it was possible to predict the lifetime of line-and-space molds over repeated transfers. As the transcription was repeated, the contact angle along the line patterns decreased significantly before becoming constant. Moreover, the contact angle across the line pattern decreased slowly while maintaining a high contact angle with respect to the contact angle along the line pattern. The contact angle then decreased linearly from approximately 90°. The mold was found to be macroscopically defect when the values of the contact angle along the line pattern and the contact angle across the line pattern were close. Predicting the mold’s lifetime could potentially lead to a shortened durability evaluation time and the avoidance of pattern defects.

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Section: Methodsmentioning

confidence: 99%

Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

2020

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“…Several alicyclic epoxy resins were blended for this study, and one typical alicyclic epoxy resin is 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate. The fluorinated component of 52-4K-33 segregates at the surface of the cured resin after heat treatment and imparts an antifouling property to the surface of the resin [14,15].…”

Section: Experimental Apparatus and Methodsmentioning

confidence: 99%

Improvement in Transfer Performance for Antireflection Structured Films with Antifouling Properties via Partial-filling Technique

Eto

Hiwasa²,

Taniguchi

2017

J. Photopol. Sci. Technol.

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Ultraviolet nanoimprint lithography (UV-NIL) is the most effective technique for mass fabrication of antireflection structure (ARS) films. For ARS films applied on touch-panel devices such as mobile phones and tablet computers, however, it is necessary to protect them from fingerprints and dust. Therefore, a UV-curable epoxy resin has been developed with antifouling properties for use with UV-NIL. However, because the developed epoxy resin possesses a high adhesive strength that ultimately reduces the lifetime of nanopatterned molds such as those for ARS, the ARS films herein were fabricated by a partial filling technique. The technique of partial filling uses an incomplete filling ratio of resin, and the work herein specifies the lower and higher filling pressures used for the repetitive transfer test. As a result, up to 200 ARS film imprints were successfully fabricated that exhibited excellent performance using lower pressure filling UV-NIL; while the reflectance obtained was less than 0.5%. In addition, the fabricated ARS films were evaluated for their antifouling properties and their transfer durability performance using the wipe test and the repeated transfer test, respectively.

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“…X433-3 has a high hardness and can be used for an NIL mold (Otsuka et al, 2014). The pressure and UV exposure energy were 0.3 MPa and 3000 mJ/cm 2 , respectively.…”

Section: Methodsmentioning

confidence: 99%

Miniaturization technique for nanoimprint replica mold with line and space pattern via mechanical deformation

Unno

Miebori

Nakamura³

et al. 2016

JAMDSM

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A demand for a nanoscale patterning method with high throughput exists for the fabrication of next-generation devices. Nanoimprint lithography (NIL) is a major breakthrough for obtaining the nanoscale pattern because of its high resolution and simple process. Because the resolution of NIL depends on the features of the master mold, it is very important to prepare a fine mold. Electron beam lithography (EBL) is typically used for the fabrication of NIL molds because EBL has a resolution of sub-10 nm. However, EBL is low throughput process and performed in a vacuum; it is difficult to obtain a large mold via EBL. On the other hand, direct laser writing (DLW) performed in the atomosphere is also promising method for the fabrication of a NIL mold because DLW can fabricate an arbitrary pattern in a large area. However, it is difficult to achieve the resolution of sub-100 nm with DLW because of a diffraction limit. To fabricate a fine mold in a large area, we have developed a miniaturization technique of a replica mold made of an elastic UV-curable resin using mechanical deformation. Although, the miniaturization of a line and space (LS) pattern of several hundreds nm width was already demonstrated, the miniaturization characteristics of a several micron and sub-100 nm width pattern are not examined. In this study, the deformation characteristics of the LS pattern with the micron and sub-100 nm width are examined. As a result, it became clear that our miniaturization technique can apply to the micron pattern. In addition, we succeeded in reducing the size of an LS pattern with a line width of less than 50 nm.

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Development of release agent-free replica mould material for ultraviolet nanoimprinting

Cited by 27 publications

References 13 publications

Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

Improvement in Transfer Performance for Antireflection Structured Films with Antifouling Properties via Partial-filling Technique

Miniaturization technique for nanoimprint replica mold with line and space pattern via mechanical deformation

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