2022
DOI: 10.1016/j.jmrt.2022.05.101
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Development of system to grow ZnO films by plasma assisted reactive evaporation with improved thickness homogeneity for using in solar cells

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Cited by 4 publications
(3 citation statements)
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“…The thin films were sintered at 500 °C. The ZnO thin films were deposited by plasma-assisted reactive evaporation technique as previously reported . The structural properties of the thin films were determined by X-ray diffraction measurements and scanning electron microscopy (SEM) assays.…”
Section: Methodsmentioning
confidence: 99%
“…The thin films were sintered at 500 °C. The ZnO thin films were deposited by plasma-assisted reactive evaporation technique as previously reported . The structural properties of the thin films were determined by X-ray diffraction measurements and scanning electron microscopy (SEM) assays.…”
Section: Methodsmentioning
confidence: 99%
“…However, anchoring the semiconductor to a surface (e.g., thin films, coatings) can solve these problems. The semiconductors can be deposited as thin films by various methods, namely: (i) physical (e.g., pulsed-laser deposition [ 9 ], sputtering [ 10 ], reactive evaporation [ 11 ], thermal evaporation [ 12 ] and, atomic layer deposition [ 13 ], ultrasonic and microwave-assisted methods [ 14 ]); (ii) chemical (e.g., electrochemical [ 15 ], chemical vapor deposition [ 16 ], SILAR technique [ 17 ], chemical bath deposition (CBD) [ 18 ], and sol-gel method [ 19 ]).…”
Section: Introductionmentioning
confidence: 99%
“…Using this approach, dense and smooth thin films and nanostructured hybrid materials of metal chalcogenides like CdS [15][16][17], TiO 2 [18][19][20], and ZnO [21][22][23] were fabricated through organic templates. Among them, the transparent semiconductor ZnO is of particular interest as it covers a vast range of applications from optoelectronics [24,25] to gas sensors [26,27] and lasing devices [28,29], etc.…”
Section: Introductionmentioning
confidence: 99%