2008
DOI: 10.1016/j.jnoncrysol.2007.10.047
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Device grade hydrogenated polymorphous silicon deposited at high rates

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Cited by 20 publications
(17 citation statements)
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“…Contrary to pc-Si:H, pm-Si:H films can be made thick enough to be used as an absorber layer of thin film solar cells because the microstructure of pm-Si:H does not depend on the thickness of the film or on the nature of the substrate, as its deposition mechanism mainly relies on the silicon nanocrystals synthesized in the plasma, so the nanocrystals distribute to all over the film thickness. Moreover, such deposition conditions coincide with those which result in a higher deposition rate compared to a-Si:H [8]. Through spectroscopic ellipsometry, Rutherford Backscattering and ERDA measurements, it has been shown that pm-Si:H films are denser than a-Si:H films, in spite of their high hydrogen content, in the range of 15−20% [7].…”
Section: Introductionsupporting
confidence: 57%
See 1 more Smart Citation
“…Contrary to pc-Si:H, pm-Si:H films can be made thick enough to be used as an absorber layer of thin film solar cells because the microstructure of pm-Si:H does not depend on the thickness of the film or on the nature of the substrate, as its deposition mechanism mainly relies on the silicon nanocrystals synthesized in the plasma, so the nanocrystals distribute to all over the film thickness. Moreover, such deposition conditions coincide with those which result in a higher deposition rate compared to a-Si:H [8]. Through spectroscopic ellipsometry, Rutherford Backscattering and ERDA measurements, it has been shown that pm-Si:H films are denser than a-Si:H films, in spite of their high hydrogen content, in the range of 15−20% [7].…”
Section: Introductionsupporting
confidence: 57%
“…Through spectroscopic ellipsometry, Rutherford Backscattering and ERDA measurements, it has been shown that pm-Si:H films are denser than a-Si:H films, in spite of their high hydrogen content, in the range of 15−20% [7]. The peculiar structure of pm-Si:H results in a low defect density (of the order of 10 14 cm −3 eV −1 at Fermi level as measured by SCLC and modulated photocurrent) and higher resistance to light-soaking than aSi:H [8][9][10]. In particular improved hole transport appears to be a key point for the application of this material in solar cells [11].…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, pm-Si:H films were obtained by the dissociation of a 10% silane in hydrogen mixture at 2-4 Torr under an RF power of 90 mW/cm 2 . A deposition rate of 9Å/s could be achieved for the pm-Si:H films [21]. We experimented with two different deposition temperatures (175…”
Section: Methodsmentioning
confidence: 99%
“…Polymorphous silicon is a heterogeneous material processed at higher pressure and higher power in a regime close to the powder regime, where nanoparticles formed in the plasma are deposited onto the substrate and embedded in an amorphous matrix [23e27]. It has been shown that pm-Si:H has a lower defect density than a-Si:H, and a better stability, while the bandgap energy is slightly larger [15].…”
Section: Introductionmentioning
confidence: 99%