2001
DOI: 10.1006/jcis.2000.7312
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Dewetting Patterns in a Drying Liquid Film

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Cited by 121 publications
(93 citation statements)
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“…This form of the cut-off term in the van der Waals pressure has an algebraic dependency on the layer thickness h j (j = 1, 2) where the exponent m must be chosen to be greater than 3; this assumption has been used widely for various values of m (Seemann et al 2001;Schwartz et al 2001). In this study we fix m = 6, but the precise value of m does not influence the dynamics of rupture significantly.…”
Section: Nonlinear Dewettingmentioning
confidence: 99%
“…This form of the cut-off term in the van der Waals pressure has an algebraic dependency on the layer thickness h j (j = 1, 2) where the exponent m must be chosen to be greater than 3; this assumption has been used widely for various values of m (Seemann et al 2001;Schwartz et al 2001). In this study we fix m = 6, but the precise value of m does not influence the dynamics of rupture significantly.…”
Section: Nonlinear Dewettingmentioning
confidence: 99%
“…Each The liquid is assumed incompressible and Newtonian, with constant density ρ and surface tension σ. The solvent concentration c s = h s /h is defined by the ratio of the imaginary thickness of the solvent layer, h s , to the total film thickness h 13 and, following previous studies 9,13,14 , the viscosity µ is assumed to depend exponentially on c s , obeying:…”
Section: A Governing Equationsmentioning
confidence: 99%
“…More sophisticated evaporation models would be required for larger variations such as the power law proposed in Schwartz et al 9 .…”
Section: A Governing Equationsmentioning
confidence: 99%
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