2009
DOI: 10.1016/j.susc.2009.09.013
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DFT study on H2O activation by stepped and planar Rh surfaces

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Cited by 31 publications
(25 citation statements)
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“…2(n 2(p and q). For H 2 O, the plane formed by the three atoms is nearly parallel to the surface; this result is in good agreement with the previous study by van Grootel et al 44 3.2. CH x (x ¼ 1-3) formation from methane For CH x (x ¼ 1-3) formation from methane, the sequential dehydrogenation of CH 4 is investigated.…”
Section: Adsorption Of Reactants Products and Possible Intermediatessupporting
confidence: 93%
“…2(n 2(p and q). For H 2 O, the plane formed by the three atoms is nearly parallel to the surface; this result is in good agreement with the previous study by van Grootel et al 44 3.2. CH x (x ¼ 1-3) formation from methane For CH x (x ¼ 1-3) formation from methane, the sequential dehydrogenation of CH 4 is investigated.…”
Section: Adsorption Of Reactants Products and Possible Intermediatessupporting
confidence: 93%
“…The SMR reaction is widely implemented for production of hydrogen or other useful products [ 34 36 ]. The water dissociation is believed to be one of the rate controlling elementary reaction steps in the SMR reaction [ 37 ].…”
Section: Introductionmentioning
confidence: 99%
“…The first hydrogen abstraction on Rh (111) was 0.02 eV faster than that on Fe (110). 208 However, *H2O and *OH dissociation on Ni (111) surface was 0.28 and 0.13 eV slower than that on Fe (110) surface, respectively. 209 The energy barrier for *H2O dissociation on Cu (111) was higher than 1 eV and the *OH dissociation was even harder with a high energy barrier of 1.51 eV.…”
Section: Resultsmentioning
confidence: 94%
“…0.68, 0.67, and 0.39 eV higher, respectively. [206][207][208]211 This indicated the positive influence of Mo6S8 cluster for the adsorption of H2O. Obviously, H2O adsorption was much stronger than CH4 adsorption, indicating that H2O…”
Section: Resultsmentioning
confidence: 96%
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