Dialkyl fumarate copolymers: new photoresist materials for deep- and mid-UV microlithography

Polymers from aryl cyclic sulfonium zwitterions—photosensitive materials cast from and developed in water

“…These materials can be cast from water and are designed to undergo a change in water solubility upon irradiation. Darling and co-workers 5 prepared alternating copolymers of maleic anhydride with other monomers, such as ethylene and methyl vinyl ether. These copolymers were hydrolyzed in neutral boiling water to polycarboxylates, which dissolved in the water.…”