1993
DOI: 10.1016/0925-9635(93)90094-i
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Diamond deposition in a bell-jar reactor: influence of the plasma and substrate parameters on the microstructure and growth rate

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Cited by 50 publications
(21 citation statements)
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“…Hydrogen containing discharges are widely used in various industrial applications, such as etching processes, reduction in oxides on surfaces, surface passivation, and film deposition. [1][2][3][4][5] For example, the discharges of hydrogen in a mixture with silane or hydrocarbons are used in order to produce the precursors for the plasma assisted deposition of microcrystalline silicon thin films or diamond synthesis, respectively. [4][5][6][7] Recently, various surface treatments of SiCOH-type films by exposure to hydrogen plasmas have been investigated.…”
Section: Introductionmentioning
confidence: 99%
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“…Hydrogen containing discharges are widely used in various industrial applications, such as etching processes, reduction in oxides on surfaces, surface passivation, and film deposition. [1][2][3][4][5] For example, the discharges of hydrogen in a mixture with silane or hydrocarbons are used in order to produce the precursors for the plasma assisted deposition of microcrystalline silicon thin films or diamond synthesis, respectively. [4][5][6][7] Recently, various surface treatments of SiCOH-type films by exposure to hydrogen plasmas have been investigated.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4][5] For example, the discharges of hydrogen in a mixture with silane or hydrocarbons are used in order to produce the precursors for the plasma assisted deposition of microcrystalline silicon thin films or diamond synthesis, respectively. [4][5][6][7] Recently, various surface treatments of SiCOH-type films by exposure to hydrogen plasmas have been investigated. 8 In these applications, the active species, such as hydrogen atoms and hydrogen ions, should be responsible for surface reactions in various processes, and the hydrogen containing discharges with a high dissociation rate are required as sources of such active species.…”
Section: Introductionmentioning
confidence: 99%
“…Microwave-plasma-enhanced CVD is a representative method for high-quality diamond growth. 17,18 Plasma torch is used to deposit diamond films with high deposition rate. 19 a͒ Other methods, such as fast heating, 20,21 optical pumping, [22][23][24] and substrate pretreatment, 25,26 have also been studied.…”
Section: Introductionmentioning
confidence: 99%
“…15 The undoped and high resistivity (у10 11 ⍀ cm) polycrystalline CVD diamond was grown by microwave plasma enhanced CVD. 19,20 The CVD1 diamond was found to contain a low concentration of nitrogen impurities as determined by Raman spectroscopy, where a significant emission peak at 2052 cm Ϫ1 was apparent. 21 The Raman spectrum of CVD2 material showed no evidence of nitrogen incorporation.…”
Section: A Diamond Photodetectorsmentioning
confidence: 99%