Diamond deposition in a hot-filament reactor using different hydrocarbon precursor gases

May, Paul; Everitt, Nicola M.; Trevor, CG; Ashfold, Michael N. R.; Rosser, KN

doi:10.1016/0169-4332(93)90249-b

Cited by 19 publications

(3 citation statements)

References 14 publications

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“…Many carbon-based molecules, including methane and higher alkanes, ethylene, acetylene, and cyclopentane, have been explored as precursors for diamond. [7,18,19] These small hydrocarbon molecules tend to fully decompose into their atomic elements upon reaction with a hot refractory metal, [6][7][8] although some, such as cyclopentane, may also produce a minor concentration of hydrocarbon radical fragments. [7] In general, it is believed that partial fragmentation of small hydrocarbons is minimal.…”

Section: Discussionmentioning

confidence: 99%

Growth Process of Polyaniline Thin Films Formed by Hot Wire CVD

Zaharias

Bent

2009

Chemical Vapor Deposition

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We explore the use of hot-wire (HW) CVD as an alternative, solvent-free technique to produce compact films similar to conventional polyaniline. Film deposition and molecular bonding are studied as functions of Ta filament temperature, aniline pressure, and substrate temperature to allow an insight into the film growth mechanism, which is postulated to depend largely on reactions of aniline with H and C atoms generated at the hot wire. The process gas, aniline, is found to cause rapid formation of tantalum carbide and carbon deposits on the hot Ta surface. The accompanying change in film quality as the filament ages is studied.

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Section: Discussionmentioning

confidence: 99%

Growth Process of Polyaniline Thin Films Formed by Hot Wire CVD

Zaharias

Bent

2009

Chemical Vapor Deposition

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“…Two boron-doped p-type diamond films were grown on a 10 × 10 mm p-type single crystal Si substrate by the method of hot filament chemical vapour deposition (HFCVD) [14] using a linear array of rhenium filaments. The substrate was manually abraded using 1-3 µm graded diamond powder (Diadust, Geneva, Switzerland) to provide a seed layer for diamond growth.…”

Section: Chemical Vapour Depositionmentioning

confidence: 99%

Use of energy-filtered photoelectron emission microscopy and Kelvin probe force microscopy to visualise work function changes on diamond thin films terminated with oxygen and lithium mono-layers for thermionic energy conversion

Andrade

Othman

O’Donnell

et al. 2014

IJNT

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Kelvin probe force microscopy (KPFM) and energy-filtered photoelectron emission microscopy (EF-PEEM) with vacuum UV (VUV) excitation have been used to study the work function of p-type diamond films treated to exhibit a negative electron affinity (NEA) surface. NEA was generated by a lithium-oxygen monolayer termination. This monolayer was achieved in two different ways: thermally evaporated films 50 nm thick were either treated by in situ vacuum annealing or by a subsequent water wash. The work function values obtained from these samples by EF-PEEM were compared with KPFM measurements to establish which of the two fabrication techniques was most effective in activating a NEA surface. The washing method was shown to be more effective and the work function values obtained by the two techniques were comparable, as they showed the same work function peaks at 4.54 eV in their respective histograms. It was found that neighbouring polycrystalline facets could show a large variation in work function of up to 400 meV.

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“…NCD coating is utilized in applications involving high-speed machining and micromachining, such as the fabrication of printed circuit boards (PCB) [3]. There consist various processing parameters for growing MCD and NCD diamond films via HFCVD, e.g., selection of precursor gas as the carbon source (i.e., methane, ethene and acetone [4]), filament material (i.e., tungsten [5], tantalum [6]), filament temperature, pre-treatment, seeding method of substrate, and functional enhancement of the HFCVD machine. In order to control the crystal orientation and grain size during growth of diamond film, researchers have suggested a number of approaches, including an application of magnetic field in the HFCVD machine.…”

Section: Introductionmentioning

confidence: 99%