Handbook of Ceramic Hard Materials 2000
DOI: 10.1002/9783527618217.ch18
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Diamond‐Like Carbon Films

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Cited by 4 publications
(3 citation statements)
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“…1 dargestellt, kohlenstoffbasierte Schichten in Diamantschichten, wasserstoffreie ta-C-Schichten, wasserstoffhaltige DLC-oder auch a-C:H-Schichten, metallhaltige und damit leitfa È hige Me-DLC-oder Me-C:H-Schichten und mit nichtmetallischen Elementen modifizierte DLC-oder a-C:H:X-Schichten [1,2]. Heute steht den Anwendern eine Stoffgruppe von harten, verschleissbesta È ndigen und sehr reibarmen bis hin zu teflona È hnlichen Schichttypen fu È r die unterschiedlichsten technischen Anwendungen zur Verfu È gung.…”
Section: Introductionunclassified
“…1 dargestellt, kohlenstoffbasierte Schichten in Diamantschichten, wasserstoffreie ta-C-Schichten, wasserstoffhaltige DLC-oder auch a-C:H-Schichten, metallhaltige und damit leitfa È hige Me-DLC-oder Me-C:H-Schichten und mit nichtmetallischen Elementen modifizierte DLC-oder a-C:H:X-Schichten [1,2]. Heute steht den Anwendern eine Stoffgruppe von harten, verschleissbesta È ndigen und sehr reibarmen bis hin zu teflona È hnlichen Schichttypen fu È r die unterschiedlichsten technischen Anwendungen zur Verfu È gung.…”
Section: Introductionunclassified
“…DLC represents a major field of interest in the biomaterials community due to its antibacterial properties. The term 'diamond-like carbon', or 'DLC', was coined in the early 1970s to denote amorphous carbon films, which are expected to recapitulate those of genuine diamond in terms of density, strength and hardness [109]. Indeed, DLC films are characterised by high hardness (10-30 GPa) and high elastic modulus (100-300 GPa) [110].…”
Section: Metal Nanoparticle Coatingsmentioning
confidence: 99%
“…The decrease in the content of undesirable molecules and residual gases, such as water vapor and oxygen, in the deposition chamber is proposed as one of the key factors reducing the oxygen in the structure of the deposited interlayer . Moreover, traces of oxygen in the films are likely the reason of observed spontaneous delamination of the film because they easily replace chemical bonds such as Si–C and Si–Fe that would favor adhesion. , Therefore, a quantitative understanding of the interface’s chemistry is necessary, and it is still lacking, considering at this point the influence of residual oxygen stemming from the molecules present in the deposition chamber. Moreover, modeling approaches could enhance such analysis, helping as well on the quantitative comprehension of adhesion as a function of processing parameters and further industrial application of the findings.…”
Section: Introductionmentioning
confidence: 99%