Dielectric behavior of triethoxyfluorosilane aerogels

Low Dielectric Constant Materials

“…Inspired by the integration of fluorinated silica glass (FSG) in manufacturing processes, Roepsch has prepared fluorine-doped aerogels. 397 Triethoxyfluorosilane (TEFS) was chosen in this case as the fluorine-containing precursor for the preparation of aerogel samples. Fluorine was only partially retained in the structure of the aerogel due to hydrolysis of the Si-F bond.…”

“…Most of the aerogels reported in the literature are synthesized from tetraalkoxysilane precursors resulting in materials exclusively composed of silica. Inspired by the integration of fluorinated silica glass (FSG) in manufacturing processes, Roepsch has prepared fluorine-doped aerogels . Triethoxyfluorosilane (TEFS) was chosen in this case as the fluorine-containing precursor for the preparation of aerogel samples.…”

Reinforcement mechanism for mechanically enhanced xerogel films

“…Using aerogels to study solid xerogel structures permits us to qualitatively compare to xerogel structure sizes and morphologies. Aerogels were synthesized with different values of r and R. The dielectric constant for these TEFS aerogels ranges from 1.13 to 1.19 for densities of 0.12 g cm À3 (95% porosity), with mean pore sizes of $3.5 nm [18]. As seen in Fig.…”

“…Lower intensities of alkoxide peaks imply more complete hydrolysis and condensation reactions. The loss of fluorine (i.e., Si-F) without a corresponding increase in Si-OH suggests that Si-O-Si bonds are formed [25]. Longer gel times logically provide greater time for films to optimize their configurations.…”