2016
DOI: 10.1016/j.physe.2016.04.029
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Dielectric properties and study of AC electrical conduction mechanisms by non-overlapping small polaron tunneling model in Bis(4-acetylanilinium) tetrachlorocuprate(II) compound

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Cited by 23 publications
(5 citation statements)
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“…Many frameworks can be intended to link the ac conduction mechanism with the s(T) behavior in finding the most likely conduction mechanism for the sample's ac conductivity. The following theoretical frameworks are most relevant according to the existing literature: 29,63 I. The nonoverlapping small polaron tunneling (NSPT) model, wherein the frequency exponent (s) grows as temperature increases.…”
Section: Resultsmentioning
confidence: 99%
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“…Many frameworks can be intended to link the ac conduction mechanism with the s(T) behavior in finding the most likely conduction mechanism for the sample's ac conductivity. The following theoretical frameworks are most relevant according to the existing literature: 29,63 I. The nonoverlapping small polaron tunneling (NSPT) model, wherein the frequency exponent (s) grows as temperature increases.…”
Section: Resultsmentioning
confidence: 99%
“…Charge carriers or small polarons may be trapped at structural defects or localized states, resulting in ac conductivity due to the tunneling of such trapped charge carriers or small polarons. The frequency exponent (s), as indicated by the NSPT model, can be written as 63,64 ( )…”
Section: Resultsmentioning
confidence: 99%
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“…Actually, the term “small” implies that the polarons are localized with their distortion clouds non-overlapping . According to the small polaron tunneling model, n can be expressed by where ω is the frequency in Hz (s –1 ), T is the temperature in K, τ 0 is the characteristic relaxation time (∼10 –13 s, in the order of atomic vibrational period), K B is the Boltzmann constant, and W H is the polaron hopping energy (height of the maximum barrier). , Using this model, the polaron hopping energy ( W H ) has been calculated and the corresponding magnitudes are ∼0.23 and 0.45 eV for nc-SiO X :H (sample A) and a-SiO X :H (sample B) thin films prepared at CO 2 = 0.25 sccm and CO 2 = 0.40 sccm, respectively.…”
Section: Results and Discussionmentioning
confidence: 99%